Effect of excitation frequency on microcrystalline silicon materials prepared by VHF-PECVD

Wuli Xuebao/Acta Physica Sinica

Volumn 55, Issue 3, 2006, Pages 1497-1501

  Gao, Yan Tao ^a   Zhang, Xiao Dan ^a   Zhao, Ying ^a   Sun, Jian ^a   Zhu, Feng ^a   Wei, Chang Chun ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

Excitation frequency; Intrinsic microcrystalline silicon; Very high frequency plasma enhanced chemical vapor deposition

Indexed keywords

EID: 33645779304     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)