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Volumn 95, Issue 1, 2011, Pages 2-6
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Large-area multicrystalline silicon solar cell fabrication using reactive ion etching (RIE)
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Author keywords
Light trapping; Multicrystalline silicon; Reactive ion etching; Solar cell; Surface texturing
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Indexed keywords
ANTI-REFLECTION;
CRYSTALLINE SILICON WAFERS;
FILL FACTOR;
HIGH EFFICIENCY;
LIGHT-TRAPPING;
LOW COSTS;
MASK LESS;
MULTI-CRYSTALLINE SILICON;
MULTI-CRYSTALLINE SILICON SOLAR CELLS;
MULTICRYSTALLINE SILICON (MC-SI);
PLASMA SURFACE TEXTURING;
PROCESSING STEPS;
REACTIVE ION;
SURFACE REFLECTANCE;
SURFACE TEXTURING;
ACIDS;
ANTIREFLECTION COATINGS;
CONVERSION EFFICIENCY;
IONS;
OPEN CIRCUIT VOLTAGE;
POLYSILICON;
POTASSIUM HYDROXIDE;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON SOLAR CELLS;
SILICON WAFERS;
SOLAR CELLS;
TEXTURING;
REACTIVE ION ETCHING;
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EID: 78149357120
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solmat.2010.03.029 Document Type: Conference Paper |
Times cited : (144)
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References (13)
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