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Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 31-37

Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

(1) Roca I Cabarrocas, P a

a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0348137163 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(99)00714-0 Document Type: Article

Times cited : (190)

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