Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation

Journal of Applied Physics

Volumn 85, Issue 5, 1999, Pages 2991-2993

  Vetterl, O ^a   Hapke, P ^a   Houben, L ^a   Finger, F ^a   Carius, R ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001505827     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369616     Document Type: Article

References (12)

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