In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfaces

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 695-699

  Forster Ch ^a   Schnabel, F ^a   Weih, P ^a   Stauden, Th ^a   Ambacher, O ^a   Pezoldt, J ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Cleaning; Hydrogen plasma; In situ ellipsometry; Silicon

Indexed keywords

CONTAMINATION; ELLIPSOMETRY; PLASMA APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPECTROSCOPIC ANALYSIS; SURFACE CLEANING; SURFACE STRUCTURE; ULTRAVIOLET RADIATION;

HYDROGEN PLASMA; IN SITU ELLIPSOMETRY; PLASMA CLEANING; SUBSTRATE TEMPERATURE;

SILICON;

EID: 15744371617     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.255     Document Type: Conference Paper

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