A global model for C4F8 plasmas coupling gas phase and wall surface reaction kinetics

Journal of Physics D: Applied Physics

Volumn 41, Issue 19, 2008, Pages

  Kokkoris, George ^a   Goodyear, Andy ^b   Cooke, Mike ^b   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

GLOBAL MODELING; ZERO-DIMENSIONAL;

EID: 53349089899     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/19/195211     Document Type: Article

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