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Volumn 44, Issue 17, 2011, Pages

Plasma-aided fabrication in Si-based photovoltaic applications: An overview

Author keywords

[No Author keywords available]

Indexed keywords

COMPETITIVE ADVANTAGE; CURRENT STATUS; FREE SURFACES; N-TYPE CONDUCTIVITY; P-N JUNCTION; PHOTOVOLTAIC APPLICATIONS; PHOTOVOLTAIC INDUSTRY; PLASMA PHYSICS; PLASMA PROCESS; PLASMA TECHNOLOGY; SI SUBSTRATES; SI-BASED; SI-BASED SOLAR CELLS; SILICATE GLASS; TEXTURIZATION; WAFER CLEANING;

EID: 79954582414     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/17/174033     Document Type: Article
Times cited : (28)

References (150)
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    • 0003987270 scopus 로고    scopus 로고
    • Processing of refractory carbides and nitrides (coatings)
    • Westwood, NJ: Noyes Publications
    • Pierson H O 1996 Processing of refractory carbides and nitrides (coatings) Handbook of Refractory Carbides and Nitrides (Westwood, NJ: Noyes Publications) p 290 chapter 15
    • (1996) Handbook of Refractory Carbides and Nitrides
    • Pierson, H.O.1
  • 123
    • 57349094709 scopus 로고    scopus 로고
    • Jia Y et al 2008 Adv. Mater. 20 4594
    • (2008) Adv. Mater. , vol.20 , Issue.23 , pp. 4594
    • Jia, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.