Effect of frequency in the deposition of microcrystalline silicon from silane discharges

Journal of Applied Physics

Volumn 90, Issue 11, 2001, Pages 5799-5807

  Amanatides, E ^a   Mataras, D ^a   Rapakoulias, D E ^a  

^a UNIVERSITY OF PATRAS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035576247     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1413240     Document Type: Article

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