Plasma nanofabrications and antireflection applications

Journal of Physics D: Applied Physics

Volumn 40, Issue 8, 2007, Pages 2242-2246

  Shieh, J ^a   Lin, C H ^a   Yang, M C ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA APPLICATIONS; PLASMA ETCHING; SEMICONDUCTOR QUANTUM DOTS; SILICON WAFERS; SPECTROPHOTOMETRY; SYNTHESIS (CHEMICAL);

ANTIREFLECTION APPLICATIONS; NANOGRASS SURFACE; PLASMA NANOFABRICATIONS; POROUS FILMS;

NANOSTRUCTURED MATERIALS;

EID: 34248550017     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/8/S02     Document Type: Article

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