Interface engineering and chemistry of Hf-based high-k dielectrics on III-V substrates

Surface Science Reports

Volumn 68, Issue 1, 2013, Pages 68-107

  He, Gang ^a   Chen, Xiaoshuang ^b   Sun, Zhaoqi ^a  

^a ANHUI UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; HIGH DIELECTRIC CONSTANTS; HIGH-K GATE DIELECTRICS; III-V COMPOUND SEMICONDUCTOR; INTERFACE ENGINEERING; INTERFACE TRAP DENSITY; SURFACE PASSIVATION; THERMODYNAMICALLY STABLE;

DIELECTRIC DEVICES; DIELECTRIC MATERIALS; GATE DIELECTRICS; HAFNIUM; HAFNIUM COMPOUNDS; SEMICONDUCTING SILICON; SILICON;

INTERFACES (MATERIALS);

EID: 84875415616     PISSN: 01675729     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfrep.2013.01.002     Document Type: Article

References (250)

1. G. Streetman, and Sanjay Banerjee Solid State Electronic Devices fifth edition 2000 Prentice Hall Upper Saddle River, New Jersey
2. K. Srivasta IEEE Potentials 8 1989 23
3. T. Skotnicki, C. Fenouillet-Beranger, C. Gallon, F. Boeuf, S. Monfray, F. Payet, A. Pouydebasque, M. Szczap, A. Farcy, and F. Arnaud IEEE Transactions on Electron Devices 55 2008 96
4. S. Datta, G. Dewey, M. Doczy, B.S. Doyle, B. Jin, J. Kavalieros, R. Kotlyar, M. Metz, N. Zelick, and R. Chau IEDM Technical Digest 2003 653
5. Y.Q. Wu, Y. Xuan, T. Shen, Z. Cheng, A. Lochtefeld, and P.D. Ye Applied Physics Letters 91 2007 022108
6. A. Ritenour, S. Yu, M.L. Lee, N. Lu, W. Bai, A. Pitera, E.A. Fitzgerald, D.L. Kwong, and D.A. Antoniadis IEDM Technical Digest 2003 433
7. F. Ren, M. Hong, W.S. Hobson, J.M. Kuo, J.R. Lothian, J.P. Mannaerts, J. Kwo, S.N.G. Chu, Y.K. Chen, and A.Y. Cho Solid-State Electronics 41 1997 1751
8. J.W. Sleight, I. Lauer, O. Dokumaci, D.M. Fried, D. Guo, B. Haran, S. Narasimha, C. Sheraw, D. Singh, M. Steigerwalt, X. Wang, P. Oldiges, D. Sadana, C.Y. Sung, W. Haensch, and M. Khare IEDM Technical Digest 2006 697
9. S. Watanabe IEEE Transactions on Electron Devices 50 2003 2073
10. 〈http://www.itrs.net〉
11. T.H. Windhorn, L.W. Cook, and G.E. Stillman IEEE Electron Device Letters 36 1982 18
12. U.P. Gomes, Y.K. Yadav, S. Chowdhury, K. Ranjan, S. Rathi, and D. Biswas Journal of Nano- and Electronic Physics 4 2012 02009
13. J. Huang, N. Geol, H. Zhao, C.Y. Kang, K.S. Min, G. Bersuker, S. Oktyabrsky, C.K. Gaspe, M.B. Santos, P. Majhi, P.D. Kirsch, H.H. Tseng, J.C. Lee, and R. Jammy IEDM Technical Digest 2009 355
14. Y. Sun, S.E. Thompson, and T. nishida Journal of Applied Physics 101 2007 104503
15. G.C. Osbourn Physical Review B 27 1983 5126
16. B. Laikhtman, R.A. Kiehl, and D.J. Frank Journal of Applied Physics 70 1991 1531
17. B.R. Behhett, M.G. Ancona, J.B. Boos, and B.V. Shanabrook Applied Physics Letters 91 2007 042104
18. B.R. Behhett, M.G. Ancona, J.B. Boos, C.B. Canedy, and S.A. Khan Journal of Crystal Growth 311 2008 47
19. W.E. Spicer, Z. Liliental-Weber, N. Newman, T. Kendelewicz, R. Cao, C. McCants, P. Mahowald, K. Miyano, and I. Lindau Journal of Vacuum Science and Technology B 6 1988 1245
20. T.E. Kazior, J. Lagowski, and H.C. Gatos Journal of Applied Physics 54 1983 2533
21. G. He, J.X. Zhang, L.Q. Zhu, M. Liu, Q. Fang, and L.D. Zhang Nanotechnology 16 2005 1641
22. L.Q. Zhu, Q. Fang, G. He, M. Liu, and L.D. Zhang Nanotechnology 6 2005 2865
23. M. Seo, Y.S. Min, S.K. Kim, T.J. Park, J.H. Kim, K.D. Na, and C.S. Hwang Journal of Materials Chemistry 18 2008 4324
24. M. Seo, S.K. Kim, Y.S. Min, and C.S. Hwang Journal of Materials Chemistry 21 2011 18497
25. A. Dkhissi, G. Mazaleyrat, A. Estève, and M.Djafari Rouhani Physical Chemistry Chemical Physics 11 2009 3701
26. Y. Zhao, K. Kita, K. Kyuno, and A. Toriumi Journal of Applied Physics 46 2007 4189
27. Y. Zhao, K. Kita, K. Kyuno, and A. Toriumi Journal of Applied Physics 105 2009 034103
28. R.L. Ngro, R.G. Toro, G. Malandrino, G.G. Condorelli, V. Raineri, and I.L. Fragalà Advanced Materials 15 2003 1071
29. R.L. Ngro, R.G. Toro, G. Malandrino, G.G. Condorelli, V. Raineri, and I.L. Fragalà Advanced Materials 15 2005 838
30. X.J. Wang, L.D. Zhang, G. He, J.P. Zhang, M. Liu, and L.Q. Zhu Applied Physics Letters 92 2008 042905
31. G. He, M. Liu, L.Q. Zhu, Q. Fang, and L.D. Zhang Surface Science 576 2005 67
32. G. He, G.W. Meng, L.D. Zhang, and M. Liu Applied Physics Letters 91 2007 232910
33. G. He, L.D. Zhang, X.J. Wang, J.P. Zhang, M. Liu, and C.M. Zhen Journal of Applied Physics 105 2009 014109
34. G. He, L.Q. Zhu, Z.Q. Sun, Q. Wang, and L.D. Zhang Progress in Materials Science 56 2011 475
35. G. He, Z.Q. Sun, G. Li, and L.D. Zhang Critical Reviews in Solid State and Materials Sciences 37 2012 131
36. G. He, L.D. Zhang, M. Liu, and Q. Fang Surface and Interface Analysis 43 2011 865
37. G. He, L.D. Zhang, M. Liu, and Z.Q. Sun Applied Physics Letters 97 2010 062908
38. G. He, Z.Q. Sun, M. Liu, and L.D. Zhang Applied Physics Letters 97 2010 192902
39. G. He, L.D. Zhang, G.W. Meng, G.H. Li, G.T. Fei, X.J. Wang, J.P. Zhang, M. Liu, Q. Fang, and I.W. Boyd Journal of Applied Physics 104 2008 104116
40. G. He, L.D. Zhang, G.W. Meng, G.H. Li, Q. Fang, and J.P. Zhang Journal of Applied Physics 102 2007 094103
41. 〈http://www.intel.com/products/desktop/processors/〉
42. M.M. Frank, G.D. Wilk, D. Starodub, T. Gustafsson, E. Garfunkel, Y.J. Chabal, J. Grazul, and D.A. Muller Applied Physics Letters 86 2005 152904
43. M. Passlack, R. Droopad, K. Rajagopalan, J. Abrokwah, R. Gregory, and D. Nguyen IEEE Electron Device Letters 26 2005 713
44. J. Robertson Applied Physics Letters 94 2009 152104
45. G. Brammertz, H.C. Lin, K. Martens, D. Mercier, S. Sioncke, A. Delabie, W.E. Wang, M. Caymax, M. Meuris, and M. Heyns Applied Physics Letters 93 2008 183504
46. H. Hasegawa, K.E. Forward, and H.L. Hartnagel Applied Physics Letters 26 1975 567
47. W.E. Spicer, N. Newman, C.J. Spindt, Z. Lilientalweber, and E.R. Weber Journal of Vacuum Science and Technology A 8 1990 2084
48. G.K. Dalapati, A. Sridhara, A.S.W. Wong, C.K. Chia, S.J. Lee, and D.Z. Chi Applied Physics Letters 91 2007 242101
49. T. Mimura, and M. Fukuta IEEE Transactions on Electron Devices 27 1980 1147
50. B.J. Skromme, C.J. Sandroff, E. Yablonovitch, and T. Gmitter Applied Physics Letters 51 1987 2022
51. C.W. Wilmsen, P.D. Kirchner, J.M. Baker, D.T. McInturff, G.D. Pettit, and J.M. Woodall Journal of Vacuum Science and Technology B 6 1988 1180
52. E. O'Connor, R.D. Long, K. Cherkaoui, K.K. Thomas, F. Chalvet, I.M. Povey, M.E. Pemble, P.K. Hurleya, B. Brennan, G. Hughes, and S.B. Newcomb Applied Physics Letters 92 2008 022902
53. H. Hasegawa, and M. Akazawa Applied Surface Science 255 2008 628
54. I. Ok, H.S. Kim, M. Zhang, C.Y. Kang, S.J. Rhee, C. Choi, S.A. Krishnan, T. Lee, F. Zhu, G. Thareja, and J.C. Lee IEEE Electron Device Letters 27 2006 145
55. S. Koveshnikov, C. Adamo, V. Tokranov, M. Yakimov, R. Kambhampati, M. Warusawithana, D.G. Schlom, W. Tsai, and S. Oktyabrsky Applied Physics Letters 93 2008 012903
56. J. Ivanco, T. Kubota, and H. Kobayashi Journal of Applied Physics 97 2005 073711
57. A.M. Sonnet, C.L. Hinkle, M.N. Jivani, R.A. Chapman, G.P. Pollack, R.M. Wallace, and E.M. Vogel Applied Physics Letters 93 2008 122109
58. H.L. Lu, L. Sun, S.J. Ding, M. Xu, D.W. Zhang, and L.K. Wang Applied Physics Letters 89 2006 152910
59. J. Lin, S. Lee, H.J. Oh, W. Yang, G.Q. Lo, D.L. Kwong, and D.Z. Chi IEDM Technical Digest 2008 401
60. E. O'Connor, R.D. Long, K. Cherkaoui, K.K. Thomas, F. Chalvet, I.M. Povey, M.E. Pemble, P.K. Hurleya, B. Brennan, G. Hughes, and S.B. Newcomb Applied Physics Letters 92 2008 022902
61. H. Hasegawa, and M. Akazawa Applied Surface Science 255 2008 628
62. P.D. Ye Journal of Vacuum Science and Technology A 26 2008 697
63. R.M. Wallace, P.C. McIntyre, J. Kim, and Y. Nishi MRS Bulletin 34 2009 493
64. M.L. Huang, Y.C. Chang, C.H. Chang, Y.J. Lee, P. Chang, J. Kwo, T.B. Wu, and M. Hong Applied Physics Letters 87 2005 252104
65. C.H. Chang, Y.K. Chiou, Y.C. Chang, K.Y. Lee, T.D. Lin, T.B. Wu, M. Hong, and J. Kwo Applied Physics Letters 89 2006 242911
66. M. Milojevic, F.S. Aguirre-Tostado, C.L. Hinkle, H.C. Kim, E.M. Vogel, J. Kim, and R.M. Wallace Applied Physics Letters 93 2008 202902
67. H.Y. Lin, S.L. Wu, C.C. Cheng, C.H. Ko, C.H. Wann, Y.-R. Lin, S.J. Chang, and T.B. Wu Applied Physics Letters 98 2011 123509
68. C.H. Hou, M.C. Chen, C.H. Chang, T.B. Wu, C.D. Chiang, and J.J. Luo Journal of the Electrochemical Society 155 2008 G180
69. T. Nishide, S. Honda, M. Matsuura, and M. Ide Thin Solid Films 371 2000 61
70. M. Villanueva-Ibanez, C. Le Luyer, O. Marty, and J. Mugnier Optical Materials 24 2003 51
71. M.G. Blanchin, B. Canut, Y. Lambert, V.S. Teodorescu, A. Barau, and M. Zaharescu Journal of Sol-Gel Science and Technology 47 2008 165
72. Y. Aoki, T. Kunitake, and A. Nakao Chemistry of Materials 17 2005 450
73. J.D. Wright, and N.A.J.M. Sommerdijk Sol-Gel Materials Chemistry and Applications 2001 Gordon and Breach Science Publisher Netherlands
74. Z.J. Wang, T. Kumagai, H. Kokawaa, J. Tsuaur, M. Ichiki, and R. Maeda Journal of Crystal Growth 281 2005 452
75. Z.J. Wang, T. Kumagai, H. Kokawa, M. Ichiki, and R. Maeda Journal of Electroceramics 21 2008 499
76. O. Acton, G. Ting, H. Ma, J.W. Ka, H.L. Yip, N.M. Tucker, and A.K.Y. Jen Advanced Materials 20 2008 3697
77. L. Pereira, P. Barquinha, E. Fortunato, and R. Martins Materials Science and Engineering: B 118 2005 210
78. R.K. Nahar, and A. Sharma Microelectronics International 24 2007 46
79. H. Hu, C.X. Zhu, Y.F. Lu, Y.H. Wu, T. Liew, M.F. Li, B.J. Cho, W.K. Choi, and N. Yakovlev Journal of Applied Physics 94 2003 551
80. P.F. Lee, J.Y. Dai, H.L.W. Chan, and C.L. Choy Ceramics International 30 2004 1267
81. M.A. Sahiner, J.C. Woicik, P. Gao, P. McKeown, M.C. Croft, M. Gartman, and B. Benapfla Thin Solid Films 515 2007 6548
82. G. Vellianitis, G. Apostolopoulos, G. Mavrou, K. Argyropoulos, A. Dimoulas, J.C. Hooker, T. Conard, and M. Butcher Materials Science and Engineering: B 109 2004 85
83. A. Goldenblum, I. Pintilie, M. Buda, A. Popa, M. Lisca, T. Botila, V. Teodorescu, A. Dimoulas, and G. Vellianitis Journal of Applied Physics 99 2006 064105
84. M.S. Kim, Y.D. Ko, M. Yun, J.H. Hong, M.C. Jeong, J.M. Myoung, and I. Yun Materials Science and Engineering: B 123 2005 20
85. Y.F. Loo, R. O'Kane, A.C. Jones, H.C. Aspinall, R.J. Potter, P.H. Chalker, J.F. Bickley, S. Taylor, and L.M. Smith Journal of Materials Chemistry 15 2005 1896
86. A.C. Jones, H.C. Aspinall, P.R. Chalker, R.J. Potter, T.D. Manning, Y.F. Loo, R.O. Kan, J.M. Gaskell, and L.M. Smith Chemical Vapor Deposition 12 2006 83
87. C. Dubourdieu, E. Rauwel, C. Millon, P. Chaudouët, F. Ducroquet, N. Rochat, S. Rushworth, and V. Cosnier Chemical Vapor Deposition 12 2006 187
88. L. Niinisto, J. Paivasaari, J. Niinisto, M. Putkonen, and M. Nieminen Physica Status Solidi (A) 201 2004 1443
89. K.E. Elers, V. Saanila, P.J. Soininen, W.M. Li, J.T. Kostamo, S. Haukka, J. Juhanoja, and W.F.A. Besling Chemical Vapor Deposition 8 2002 149
90. M. Vehkamaki, T. Hatanpaa, T. Hanninen, M. Ritala, and M. Leskela Electrochemical and Solid-State Letters 2 1999 504
91. G.D. Wilk, R.M. Wallace, and J.M. Anthony Journal of Applied Physics 87 2000 484
92. A. Callegari, E. Cartier, M. Gribelyuk, H.F. Okorn-Schmidt, and T. Zabel Journal of Applied Physics 90 2001 6466
93. G. He, Q. Fang, and L.D. Zhang Journal of Applied Physics 100 2006 083517
94. G. Pant, P. Punchaipetch, M.J. Kim, R.M. Wallace, and B.E. Gnade Thin Solid Films 460 2004 242
95. H. Takeuchi, and T.J. King Materials Research Society Symposium Proceedings 811 2004 D7.6.1
96. S. Duenas, H. Castan, J. Barbolla, K. Kukil, M. Ritala, and M. Lesela Solid-State Electronics 47 2003 1623
97. D.A. Neumayer, and E. Cartier Journal of Applied Physics 90 2001 1801
98. M. Sawkar-Mathur, Y.C. Perng, J. Lu, H.O. Blom, J. Bargar, and J.P. Chang Applied Physics Letters 93 2008 233501
99. H. Koinuma, and I. Takeuchi Nature Materials 3 2004 429
100. H.Y. Yu, M.F. Li, B.J. Cho, C.C. Yeo, and M.S. Joo Applied Physics Letters 81 2002 376
101. O. Buiu, Y. Lu, S. Hall, I.Z. Mitrovic, R.J. Potter, and P.R. Chalker Thin Solid Films 515 2007 3772
102. W.J. Zhu, T. Tamagawa, M. Gibson, T. Furukawa, and T.P. Ma IEEE Electron Device Letters 23 2002 649
103. S.H. Bae, C.H. Lee, R. Clark, and D.L. Kwong IEEE Electron Device Letters 24 2003 556
104. Y. Lu, O. Buiu, S. Hall, I.Z. Mitrovic, W. Davey, R.J. Potter, and P.R. Chalker Microelectronics Reliability 47 2007 722
105. M. Kadoshima, A. Ogawa, H. Ota, K. Iwamoto, M. Takahashi, N. Mise, S. Migita, M. Ikeda, H. Satake, T. Nabatame, and A. Toriumi Journal of Applied Physics 99 2006 054506
106. C. Driemeier, K.P. Bastos, L. Miotti, I.J.R. Baumvola, N.V. Nguyen, S. Sayan, and C. Krug Applied Physics Letters 86 2005 221911
107. Y.E. Hong, Y.S. Kim, K. Do, D. Lee, D.H. Koa, J.H. Ku, and H. Kim Journal of Vacuum Science and Technology A 23 2005 1413
108. Y. Yamamoto, K. Kita, K. Kyuno, and A. Toriumi Applied Physics Letters 89 2006 032903
109. D. Li, and J. Robertson Applied Physics Letters 94 2009 042904
110. M.F. Li, C.X. Zhu, C.Y. Shen, F.F. Xiong, P. Yuan, Y.C. Yeo, A. Chin, D.L. Kwong, S.H. Wang, A.Y. Du, and G. Samudra ECS Transactions 1 2006 717
111. C.H. An, M.S. Lee, J.Y. Choi, and H. Kim Applied Physics Letters 94 2009 262901
112. C.H. Wu, B.F. Hung, A. Chin, S.J. Wang, W.J. Chen, X.P. Wang, M.F. Li, C.X. Zhu, Y. Jin, H.J. Tao, S.C. Chen, and M.S. Liang IEEE Electron Device Letters 28 2007 292
113. Q.X. Xu, G.B. Xu, W.W. Wang, D.P. Chen, S.L. Shi, and Z.S. Han Applied Physics Letters 93 2008 252903
114. C.L. Cheng, K.S.C. Liao, and T.K. Wang Solid-State Electronics 50 2006 103
115. C.C. Cheng, C.H. Chien, C.W. Chen, S.L. Hsu, M.Y. Yang, and C.C. Huang Microelectronic Engineering 80 2005 30
116. M. Liu, Q. Fang, G. He, L. Li, L.Q. Zhu, G.H. Li, and L.D. Zhang Applied Physics Letters 88 2006 192904
117. C.H. Choi, T.S. Jeon, R. Clark, and D.L. Kwong IEEE Electron Device Letters 24 2003 215
118. J.H. Park, J.S. Hyun, B.C. Kang, and J.H. Boo Surface and Coatings Technology 201 2007 5336
119. Y. Wang, J. Zhang, F. Zhang, F. Zhang, and S. Zou Applied Surface Science 242 2005 407
120. K.Y. Tong, E.V. Jelenkovic, W. Liu, and J.Y. Dai Microelectronic Engineering 83 2006 293
121. G. He, Q. Fang, and L.D. Zhang Materials Science in Semiconductor Processing 9 2006 870
122. M. Liu, Q. Fang, G. He, L.Q. Zhu, and L.D. Zhang Applied Surface Science 252 2006 8673
123. J.H. Park, J.S. Hyun, B.C. Kang, and J.H. Boo Surface and Coatings Technology 201 2007 5336
124. K.J. Choi, J.H. Kim, S.G. Yoon, and W.C. Shin Journal of Vacuum Science and Technology B 22 2004 1755
125. J.F. Kang, H.Y. Yu, C. Ren, M.F. Li, D.S.H. Chan, and H. Hu Applied Physics Letters 84 2004 1588
126. C.H. Lu, Y.S. Lai, and J.S. Chen ECS Transactions 21 2006 425
127. X.J. Wang, L.D. Zhang, M. Liu, J.P. Zhang, and G. He Applied Physics Letters 92 2008 122901
128. G. He, L.D. Zhang, G.H. Li, M. Liu, L.Q. Zhu, S.S. Pan, and Q. Fang Applied Physics Letters 86 2005 232901
129. R. Chau, S. Datta, M. Doczy, B. Jin, J. Kavaliers, A. Majumdar, M. Metz, and M. Radosavljevic IEEE Transactions on Nanotechnology 4 2005 153
130. Y.G. Xie, S. Kasai, H. Takahashi, C. Jiang, and H. Hasegawa IEEE Electron Device Letters 22 2001 645
131. H.S. Kim, I. Ok, M. Zhang, T. Lee, F. Zhu, L. Yu, and J.C. Lee Applied Physics Letters 89 2006 222903
132. I. Ok, H.S. Kim, M. Zhang, C.Y. Kang, S.J. Rhee, C. Choi, S.A. Krishnan, T. Lee, F. Zhu, G. Thareja, and J.C. Lee IEEE Electron Device Letters 27 2006 145
133. S. Koveshnikov, W. Tsai, I. Ok, J.C. Lee, V. Torkanov, M. Yakimov, and S. Oktyabrsky Applied Physics Letters 88 2006 022106
134. S.J. Koester, E.W. Kiewra, Y. Sun, D.A. Neumayer, J.A. Ott, M. Copel, D.K. Sadana, D.J. Webb, J. Fompeyrine, J.-P. Locquet, C. Marchiori, M. Sousa, and R. Germann Applied Physics Letters 89 2006 042104
135. S. Oktyabrsky, V. Tokranov, M. Yakimov, R. Moore, S. Koveshnikov, W. Tsai, F. Zhu, and J.C. Lee Materials Science and Engineering: B 135 2006 272
136. M. Passlack, M. Hong, and J.P. Mannaerts Applied Physics Letters 68 1996 1099
137. F. Ren, J.M. Kuo, M. Hong, W.S. Hobson, J.R. Lothian, J. Lin, H.S. Tsai, J.P. Mannaerts, J. Kwo, S.N.G. Chu, Y.K. Chen, and A.Y. Cho IEEE Electron Device Letters 19 1998 309
138. K. Rajagopalan, J. Abrokwah, R. Droopad, and M. Passlack IEEE Electron Device Letters 27 2006 959
139. P.D. Ye, G.D. Wilk, J. Kwo, B. Yang, H.-J.L. Gossmann, M. Frei, S.N.G. Chu, J.P. Mannaerts, M. Sergent, M. Hong, K.K. Ng, and J. Bude IEEE Electron Device Letters 24 2003 209
140. P.D. Ye, G.D. Wilk, B. Yang, S.N.G. Chu, K.K. Ng, and J. Bude Solid-State Electronics 49 2005 790
141. Y. Xuan, H.C. Lin, P.D. Ye, and G.D. Wilk Applied Physics Letters 88 2006 263518
142. M.L. Huang, Y.C. Chang, C.H. Chang, T.D. Lin, J. Kwo, T.B. Wu, and M. Hong Applied Physics Letters 89 2006 012903
143. Y. Xuan, Y.Q. Wu, H.C. Lin, T. Shen, and P.D. Ye IEEE Electron Device Letters 28 2007 935
144. X. Li, Y. Cao, D.C. Hall, P. Fay, B. Han, A. Wibowo, and N. Pan IEEE Electron Device Letters 25 2004 772
145. Y. Cao, X. Li, J. Zhang, P. Fay, T.H. Kosel, and D.C. Hall IEEE Electron Device Letters 27 2006 317
146. C.W. Cheng, and E.A. Fitzgerald Applied Physics Letters 93 2008 031902
147. Y. Xuan, Y.Q. Wu, and P.D. Ye IEEE Electron Device Letters 29 2008 294
148. M. Passlack Journal of Vacuum Science and Technology A 23 2005 1773
149. A. Jaouad, V. Aimez, C. Aktik, K. Bellatreche, and A. Souifi Journal of Vacuum Science and Technology A 22 2004 1027
150. G. Brammertz, H.-C. Lin, K. Martens, D. Mercier, S. Sioncke, A. Delabie, W.E. Wang, M. Caymax, M. Meuris, and M. Heyns Applied Physics Letters 93 2008 183504
151. K. Rajagopalan, R. Droopad, J. Abrokwah, P. Zurcher, P. Fejes, and M. Passlack IEEE Electron Device Letters 28 2007 100
152. J.P. de Souza, E. Kiewa, Y. Sun, A. Callegari, D.K. Sadana, G. Shahidi, D.J. Webb, J. Fompeyrine, R. Germann, C. Rossel, and C. Marchiori Applied Physics Letters 92 2008 153508
153. C.Y. Kim, S.W. Cho, M.H. Cho, K.B. Chung, C.H. An, H. Kim, H.J. Lee, and D.H. Ko Applied Physics Letters 93 2008 192902
154. C.H. Chang, Y.K. Chiou, Y.C. Chang, K.Y. Lee, T.D. Lin, T.B. Wu, M. Hong, and J. Kwo Applied Physics Letters 89 2006 242911
155. H.D. Lee, T. Feng, L. Yu, D. Mastrogiovanni, A. Wan, T. Gustafsson, and E. Garfunkel Applied Physics Letters 94 2009 222108
156. G. Hollinger, R. Skheyta-Kabbani, and M. Gendry Physical Review B 49 1994 11159
157. C.L. Hinkle, A.M. Sonnet, E.M. Vogel, S. McDonnell, G.J. Hughes, M. Milojevic, B. Lee, F.S. Aguirre-Tostado, K.J. Choi, H.C. Kim, J. Kim, and R.M. Wallace Applied Physics Letters 92 2008 071901
158. M.M. Frank, G.D. Wilk, D. Starodub, T. Gustafsson, E. Garfunkel, and Y.J. Chabal Applied Physics Letters 86 2005 152904
159. J.C. Hackley, J.D. Demaree, and T. Gougousi Applied Physics Letters 92 2008 162902
160. T. Yang, Y. Xuan, D. Zemlyanov, T. Shen, Y.Q. Wu, J.M. Woodall, P.D. Ye, F.S. Aguirre-Tostado, M. Milojevic, S. McDonnell, and R.M. Wallace Applied Physics Letters 91 2007 142122
161. C.L. Hinkle, M. Milojevic, E.M. Vogel, and R.M. Wallace Microelectronic Engineering 86 2009 1544
162. J.F. Zheng, W. Tsai, T.D. Lin, Y.J. Lee, C.P. Chen, M. Hong, J. Kwo, S. Cui, and T.P. Ma Applied Physics Letters 91 2007 223502
163. S. Koveshnikov, N. Goel, P. Majhi, H. Wen, M.B. Santos, S. Oktyabrsky, V. Tokranov, R. Kambhampati, R. Moore, F. Zhu, J. Lee, and W. Tsai Applied Physics Letters 92 2008 222904
164. P.D. Ye Journal of Vacuum Science and Technology A 26 2008 697
165. H.H. Wieder, J.L. Veteran, A.R. Clawson, and D.P. Mullin Applied Physics Letters 43 1983 287
166. H.J. Oh, J.Q. Lin, S.J. Lee, G.K. Dalapati, A. Sridhara, D.Z. Chi, S.J. Chua, G.Q. Lo, and D.L. Kwong Applied Physics Letters 93 2008 062107
167. G. Brammertz, M. Heyns, M. Meuris, M. Caymax, and D. Jiang Microelectronic Engineering 84 2007 2154
168. F.S. Aguirre-Tostado, M. Milojevic, B. Lee, J. Kim, and R.M. Wallace Applied Physics Letters 93 2008 172907
169. P.D. Ye, G.D. Wilk, B. Yang, J. Kwo, S.N.G. Chu, and S. Nakahara Applied Physics Letters 83 2003 180
170. Y.C. Chang, M.L. Huang, K.Y. Lee, Y.J. Lee, T.D. Lin, and M. Hong Applied Physics Letters 92 2008 072901
171. K.Y. Lee, Y.J. Lee, P. Chang, M.L. Huang, Y.C. Chang, and M. Hong Applied Physics Letters 92 2008 252908
172. M.L. Huang, Y.C. Chang, C.H. Chang, Y.J. Lee, P. Chang, and J. Kwo Applied Physics Letters 87 2005 252104
173. C.H. Chang, Y.K. Chiou, Y.C. Chang, K.Y. Lee, T.D. Lin, and T.B. Wu Applied Physics Letters 89 2006 242911
174. M. Milojevic, F.S. Aguirre-Tostado, C.L. Hinkle, H.C. Kim, E.M. Vogel, and J. Kim Applied Physics Letters 93 2008 202902
175. B. Shin, D. Choi, J.S. Harris, and P.C. McIntyre Applied Physics Letters 93 2008 052911
176. D. Shahrjerdi, T. Rotter, G. Balakrishnan, D. Huffaker, E. Tutuc, and S.K. Banerjee IEEE Electron Device Letters 29 2008 575
177. C.J. Sandroff, M.S. Hegde, L.A. Farrow, C.C. Chang, and J.P. Harbison Applied Physics Letters 54 1989 362
178. J.K. Yang, M.G. Kang, and H.H. Park Journal of Applied Physics 96 2004 4811
179. S.A. Suleiman, H.J. Oh, A. Du, C.M. Ng, and S.J. Lee Electrochemical and Solid-State Letters 13 2010 H336
180. G. He, L.D. Zhang, M. Liu, and Z.Q. Sun Applied Physics Letters 97 2010 062908
181. G. He, L.D. Zhang, and M. Liu Applied Physics Letters 95 2009 112905
182. I. Ok, H.S. Kim, M. Zhang, F. Zhu, S. Park, J. Yum, H. Zhao, D. Garcia, P. Majhi, N. Goel, W. Tsai, C.K. Gaspe, M.B. Santos, and J.C. Lee Applied Physics Letters 92 2008 202903
183. I. Ok, H.S. Kim, M. Zhang, F. Zhu, S. Park, J. Yum, H. Zhao, and J.C. Lee Applied Physics Letters 91 2007 132104
184. H. Hasegawa, M. Akazawa, A. Domanowska, and B. Adamowicz Applied Surface Science 256 2010 5698
185. H. Hasegawa, and M. Akazawa Applied Surface Science 255 2008 628
186. H.S. Kim, I. Ok, M. Zhang, F. Zhu, S. Park, J. Yum, H. Zhao, J. Oh, P. Majhi, and J.C. Lee Applied Physics Letters 92 2008 032907
187. H.S. Kim, I. Ok, M. Zhang, F. Zhu, S. Park, J. Yum, H. Zhao, and J.C. Lee Applied Physics Letters 91 2007 042904
188. D.Y. Petrovykh, M.J. Yang, and L.J. Whitman Surface Science 523 2003 231
189. H.F. Hsieh, and H.C. Shih Materials Chemistry and Physics 44 1996 203
190. G. Eftekhari Physica Status Solidi A 161 1997 571
191. H.D. Trinh, Y.C. Lin, H.C. Wang, C.H. Chang, K. Kakushima, H. Iwai, T. Kawanago, Y.G. Lin, C.M. Chen, Y.Y. Wong, G.N. Huang, Ma. Hudait, and E.Y. Chang Applied Physics Express 5 2012 021104
192. D. Wheeler, L.E. Wernersson, L. Fröberg, C. Thelander, A. Mikkelsen, K.-J. Weststrate, A. Sonnet, E.M. Vogel, and A. Seabaugh Microelectronic Engineering 86 2009 1561
193. E. Lind, Y.M. Niquet, H. Mera, and L.E. Wernersson Applied Physics Letters 96 2010 233507
194. S. Roddaro, K. Nilsson, G. Astromskas, L. Samuelson, L.E. Wernersson, O. Karlström, and A. Wacker Applied Physics Letters 92 2008 253509
195. R. Timm, A. Fian, M. Hjort, C. Thelander, E. Lind, J.N. Andersen, L.-E. Wernersson, and A. Mikkelsen Applied Physics Letters 97 2010 132904
196. M. Xu, R. Wang, and P.D. Ye IEEE Electron Device Letters 32 2011 488
197. A. Nainani, T. Irisawa, Z. Yuan, Y. Sun, T. Krishnamohan, M. Reason, B.R. Bennett, J.B. Boos, M.G. Ancona, Y. Nishi, and K.C. Saraswat IEDM Technical Digest 2010)138
198. 〈http://www.ioffe.ru/SVA/NSM/Semicond/GaSb/bandstr.html〉
199. S. Datta, T. Ashley, J. Brask, L. Buckle, M. Doczy, M. Emeny, D. Hayes, K. Hilton, R. Jefferies, T. Martin, T.J. Phillips, D. Wallis, P. Wilding, and R. Chau IEDM Technical Digest 2005 783
200. A. Ali, H.S. Madan, A.P. Kirk, D.A. Zhao, D.A. Mourey, M.K. Hudait, R.M. Wallace, T.N. Jackson, B.R. Bennett, J.B. Boos, and S. Datta Applied Physics Letters 97 2010 143502
201. 〈http://purl.stanford.edu/fy499cg6903〉
202. C. Wang, M. Xu, J.J. Gu, D.W. Zhang, and P.D. Ye Electrochemical and Solid-State Letters 15 2012 H51
203. M. Xu, K. Xu, R. Contreras, M. Milojevic, T. Shen, O. Koybasi, Y.Q. Wu, R.M. Wallace, and P.D. Ye IEDM Technical Digest 2009 865
204. H. Zhao, D. Shahrjerdi, F. Zhu, M. Zhang, H.S. Kim, I. Ok, J.H. Yum, S. Park, S.K. Banerjee, and J.C. Lee Applied Physics Letters 92 2008 233508
205. H. Zhao, D. Shahrjerdi, F. Zhu, H.S. Kim, I. Ok, M. Zhang, J.H. Yum, S.K. Banerjee, and J.C. Lee Applied Physics Letters 92 2008 253506
206. Y.Q. Wu, Y. Xuan, T. Shen, P.D. Ye, Z. Cheng, and A. Lochtefeld Applied Physics Letters 91 2007 022108
207. Y. Xuan, Y. Wu, and P.D. Ye IEEE Electron Device Letters 29 2008 294
208. K. Rajagopalan, J. Abrokwah, R. Droopad, and M. Passlack IEEE Electron Device Letters 27 2006 959
209. C.H. An, Y.C. Byun, M.S. Lee, and H. Kim Journal of The Electrochemical Society 158 2011 G242
210. L.J. Gao, G.W. Anderson, F. Esposto, P.R. Norton, B.F. Mason, Z.H. Lu, and M.J. Graham Journal of Vacuum Science and Technology B 13 1995 2053
211. M. Shimomura, K. Naka, N. Sanada, Y. Suzuki, Y. Fukuda, and P.J. Moller Journal of Applied Physics 79 1996 4193
212. A. Kapila, X. Si, and V. Malhotra Applied Physics Letters 62 1993 2259
213. H.L. Lu, Y. Terada, Y. Shimogaki, Y. Nakano, and M. Suguyama Applied Physics Letters 95 2009 152103
214. Y.T. Chen, H. Zhao, J.H. Yum, Y.Z. Wang, and J.C. Lee Applied Physics Letters 94 2009 213505
215. R. Xie, M. Yu, M. Lai, L. Chan, and C. Zhu Applied Physics Letters 92 2008 163505
216. Y. Chen, H. Zhao, J. Yum, Y. Wang, F. Xue, F. Zhou, and J.C. Lee Journal of The Electrochemical Society 157 2010 G71
217. Y. Chen, H. Zhao, J. Yum, Y. Wang, F. Xue, F. Zhou, and J.C. Lee Applied Physics Letters 95 2009 013501
218. Y. Chen, H. Zhao, Y. Wang, F. Xue, F. Zhou, and J.C. Lee Applied Physics Letters 96 2010 102101
219. Y.Z. Wang, Y.T. Chen, F. Xue, F. Zhou, and J.C. Lee Applied Physics Letters 100 2012 243508
220. R.V. Galatage, H. Dong, D.M. Zhernokletov, B. Brennan, C.L. Hinkle, R.M. Wallace, and E.M. Vogel Applied Physics Letters 99 2011 172901
221. T.S. Lay, Y.Y. Liao, W.H. Hung, M. Hong, J. Kwo, and J.P. Mannaerts Journal of Crystal Growth 278 2005 624
222. J. Kim, R. Mehandru, B. Luo, F. Ren, B.P. Gila, A.H. Onstine, C.R. Abernathy, S.J. Pearton, and Y. Irokawa Applied Physics Letters 81 2002 373
223. C. Liu, E.F. Chor, L.S. Tan, and Y. Dong Applied Physics Letters 88 2006 222113
224. M. Hong, A.R. Kortan, H.M. Ng, J. Kwo, S.N.G. Chu, J.P. Mannaerts, A.Y. Cho, C.M. Lee, J.I. Chyi, and K.A. Anselm Journal of Vacuum Science and Technology B 20 2002 1274
225. T. Fluckiger, M. Erbudak, A. Hensch, Y. Weisskopf, M. Hong, and A.R. Kortan Surface and Interface Analysis 34 2002 441
226. Y.C. Chang, W.H. Chang, Y.H. Chang, J. Kwo, Y.S. Lin, S.H. Hsu, J.M. Hong, C.C. Tsai, and M. Hong Microelectronic Engineering 87 2010 2042
227. Y.C. Chang, M.L. Huang, Y.H. Chang, Y.J. Lee, H.C. Chiu, J. Kwo, and M. Hong Microelectronic Engineering 88 2011 1207
228. Y.C. Chang, H.C. Chiu, Y.J. Lee, M.L. Huang, K.Y. Lee, M. Hong, Y.N. Chiu, J. Kwo, and Y.H. Wang Applied Physics Letters 90 2007 232904
229. K. Matocha, R.J. Gitmann, and T.Paul Chow IEEE Transactions on Electron Devices 50 2005 1200
230. S. Arulkumaran, T. Egawa, H. Ishikawa, T. Jimbo, and M. Umeno Applied Physics Letters 73 2003 809
231. J. Kim, B. Gila, R. Mahandru, J.W. Johnson, J.H. Shin, K.P. Lee, B. Luo, A. Onstine, C.R. Abernathy, and S.J. Pearton Journal of The Electrochemical Society 149 2002 G482
232. C.F. Shih, K.T. Hung, C.Y. Hsiao, S.C. Shu, and W.M. Li Journal of Alloys and Compounds 480 2009 541
233. X.K. Liu, H.C. Chin, L.S. Tan, and Y.C. Yeo IEEE Electron Device Letters 31 2010 8
234. C. Liu, E.F. Chor, and L.S. Tan Semiconductor Science and Technology 22 2007 522
235. J.L. Yang, B.S. Eller, C. Zhu, C. Englang, and R.J. Nemanich Journal of Applied Physics 112 2012 053710
236. N. Goel, P. Majhi, C.O. Chui, W. Tsai, D. Choi, and J.S. Harris Applied Physics Letters 89 2006 163517
237. M. Leong, B. Doris, J. Kedzierski, K. Rim, and M. Yang Science 306 2004 2057
238. B.S. Doyle, S. Datta, M. Doczy, S. Hareland, B. Jin, and J. Kavalieros IEEE Electron Device Letters 24 2003 263
239. J. Wang, M.S. Gudiksen, X. Duan, Y. Cui, and C.M. Lieber Science 293 2001 1455
240. A. Javey, H. Kim, M. Brink, Q. Wang, A. Ural, and J. Guo Nature Materials 1 2002 241
241. J. Xiang, W. Lu, Y. Hu, Y. Wu, H. Yan, and C.M. Lieber Nature 441 2006 489
242. A. Javey, S. Nam, R.S. Friedman, H. Yan, and C.M. Lieber Nano Letters 7 2007 773
243. C.B. Winkelmann, I. Ionica, X. Chevalier, G. Royal, C. Bucher, and V. Bouchiat Nano Letters 7 2007 1454
244. G. Jo, J. Maeng, T.W. Kim, W.K. Hong, B.S. Choi, and T. Lee Journal of Applied Physics 102 2007 084508
245. S. Ju, K. Lee, M.H. Yoon, A. Facchetti, T.J. Mark, and D.B. Janes Nanotechnology 18 2007 155201
246. A. Javey, J. Guo, D.B. Farmer, Q. Wang, D. Wang, and R.G. Gordon Nano Letters 4 2004 447
247. M. Abe, K. Murata, T. Ataka, and K. Matsumoto Nanotechnology 19 2008 045505
248. K. Nishiguchi, Y. Ono, A. Fujiwara, H. Yamaguchi, H. Inokawa, Y. Takahashi, Applied Physics Letters 90 (2007) 223108.
249. Y.H. Ahn, and J. Park Applied Physics Letters 91 2007 162102
250. S.E. Thompson, and S. Parthasarathy Materials Today 9 2006 20