Materials characterization of Zro2-SiO2 and HfO2-SiO2 binary oxides deposited by chemical solution deposition

Journal of Applied Physics

Volumn 90, Issue 4, 2001, Pages 1801-1808

  Neumayer, D A ^a   Cartier, E ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035881403     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1382851     Document Type: Article

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