SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 94, Issue 22, 2009, Pages

Reduction of native oxides on GaAs during atomic layer growth of Al 2O3

(7) Lee, Hang Dong a Feng, Tian a Yu, Lei a Mastrogiovanni, Daniel a Wan, Alan a Gustafsson, Torgny a Garfunkel, Eric a

a RUTGERS UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; ATOMIC LAYER GROWTH; GAAS; GAAS SUBSTRATES; GAAS WAFER; MEDIUM ENERGY ION SCATTERING SPECTROSCOPIES; NATIVE OXIDES; TRIMETHYLALUMINUM; XPS MEASUREMENTS;

ALUMINA; ALUMINUM; GALLIUM ALLOYS; OXYGEN; SEMICONDUCTING GALLIUM; THERMOANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 66749167599 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3148723 Document Type: Article

Times cited : (82)

References (12)

1
- 1242332746
- 0003-6951,. 10.1063/1.1641527
- P. D. Ye, G. D. Wilk, B. Yang, J. Kwo, H. -J. L. Gossmann, M. Hong, K. K. Ng, and J. Bude, Appl. Phys. Lett. 0003-6951 84, 434 (2004). 10.1063/1.1641527
- (2004) Appl. Phys. Lett. , vol.84 , pp. 434
- Ye, P.D.¹ Wilk, G.D.² Yang, B.³ Kwo, J.⁴ Gossmann, H.-J.L.⁵ Hong, M.⁶ Ng, K.K.⁷ Bude, J.⁸

2
- 33845892121
- 0003-6951,. 10.1063/1.2405387
- C. -H. Chang, Y. -K. Chiou, Y. -C. Chang, K. -Y. Lee, T. -D. Lin, T. -B. Wu, M. Hong, and J. Kwo, Appl. Phys. Lett. 0003-6951 89, 242911 (2006). 10.1063/1.2405387
- (2006) Appl. Phys. Lett. , vol.89 , pp. 242911
- Chang, C.-H.¹ Chiou, Y.-K.² Chang, Y.-C.³ Lee, K.-Y.⁴ Lin, T.-D.⁵ Wu, T.-B.⁶ Hong, M.⁷ Kwo, J.⁸

3
- 33750198688
- 0003-6951,. 10.1063/1.2363959
- N. Goel, P. Majhi, C. O. Chui, W. Tsai, D. Choi, and J. S. Harris, Appl. Phys. Lett. 0003-6951 89, 163517 (2006). 10.1063/1.2363959
- (2006) Appl. Phys. Lett. , vol.89 , pp. 163517
- Goel, N.¹ Majhi, P.² Chui, C.O.³ Tsai, W.⁴ Choi, D.⁵ Harris, J.S.⁶

4
- 0000873829
- 1071-1023,. 10.1116/1.584244
- W. E. Spicer, Z. Liliental-Weber, E. Weber, N. Newman, T. Kendelewicz, R. Cao, C. McCants, P. Mahowald, K. Miyano, and I. Lindau, J. Vac. Sci. Technol. B 1071-1023 6, 1245 (1988). 10.1116/1.584244
- (1988) J. Vac. Sci. Technol. B , vol.6 , pp. 1245
- Spicer, W.E.¹ Liliental-Weber, Z.² Weber, E.³ Newman, N.⁴ Kendelewicz, T.⁵ Cao, R.⁶ McCants, C.⁷ Mahowald, P.⁸ Miyano, K.⁹ Lindau, I.¹⁰

5
- 0142020894
- 0021-9606,. 10.1063/1.1601596
- M. J. Hale, S. I. Yi, J. Z. Sexton, A. C. Kummel, and M. Passlack, J. Chem. Phys. 0021-9606 119, 6719 (2003). 10.1063/1.1601596
- (2003) J. Chem. Phys. , vol.119 , pp. 6719
- Hale, M.J.¹ Yi, S.I.² Sexton, J.Z.³ Kummel, A.C.⁴ Passlack, M.⁵

6
- 33751561931
- 0003-6951,. 10.1063/1.2396912
- H. -S. Kim, I. Ok, M. Zhang, T. Lee, F. Zhu, L. Yu, and J. C. Lee, Appl. Phys. Lett. 0003-6951 89, 222903 (2006). 10.1063/1.2396912
- (2006) Appl. Phys. Lett. , vol.89 , pp. 222903
- Kim, H.-S.¹ Ok, I.² Zhang, M.³ Lee, T.⁴ Zhu, F.⁵ Yu, L.⁶ Lee, J.C.⁷

7
- 39349086978
- 0021-8979,. 10.1063/1.2838471
- P. T. Chen, Y. Sun, E. Kim, P. C. McIntyre, W. Tsai, M. Garner, P. Pianetta, Y. Nishi, and C. O. Chui, J. Appl. Phys. 0021-8979 103, 034106 (2008). 10.1063/1.2838471
- (2008) J. Appl. Phys. , vol.103 , pp. 034106
- Chen, P.T.¹ Sun, Y.² Kim, E.³ McIntyre, P.C.⁴ Tsai, W.⁵ Garner, M.⁶ Pianetta, P.⁷ Nishi, Y.⁸ Chui, C.O.⁹

8
- 29144509765
- 0003-6951,. 10.1063/1.2146060
- M. L. Huang, Y. C. Chang, C. H. Chang, Y. J. Lee, P. Chang, J. Kwo, T. B. Wu, and M. Hong, Appl. Phys. Lett. 0003-6951 87, 252104 (2005). 10.1063/1.2146060
- (2005) Appl. Phys. Lett. , vol.87 , pp. 252104
- Huang, M.L.¹ Chang, Y.C.² Chang, C.H.³ Lee, Y.J.⁴ Chang, P.⁵ Kwo, J.⁶ Wu, T.B.⁷ Hong, M.⁸

9
- 20844440321
- 0003-6951,. 10.1063/1.1899745
- M. M. Frank, G. D. Wilk, D. Starodub, T. Gustafsson, E. Garfunkel, and Y. J. Chabal, Appl. Phys. Lett. 0003-6951 86, 152904 (2005). 10.1063/1.1899745
- (2005) Appl. Phys. Lett. , vol.86 , pp. 152904
- Frank, M.M.¹ Wilk, G.D.² Starodub, D.³ Gustafsson, T.⁴ Garfunkel, E.⁵ Chabal, Y.J.⁶

10
- 56849122383
- 0003-6951,. 10.1063/1.3054348
- M. Milojevic, C. L. Hinkle, F. S. Aguirre-Tostado, H. C. Kim, E. M. Vogel, J. Kim, and R. M. Wallace, Appl. Phys. Lett. 0003-6951 93, 252905 (2008). 10.1063/1.3054348
- (2008) Appl. Phys. Lett. , vol.93 , pp. 252905
- Milojevic, M.¹ Hinkle, C.L.² Aguirre-Tostado, F.S.³ Kim, H.C.⁴ Vogel, E.M.⁵ Kim, J.⁶ Wallace, R.M.⁷

11
- 0022112457
- 0021-4922,. 10.1143/JJAP.24.1043
- K. Eguchi and T. Katoda, Jpn. J. Appl. Phys., Part 1 0021-4922 24, 1043 (1985). 10.1143/JJAP.24.1043
- (1985) Jpn. J. Appl. Phys., Part 1 , vol.24 , pp. 1043
- Eguchi, K.¹ Katoda, T.²

12
- 39749157907
- 0003-6951,. 10.1063/1.2883956
- C. L. Hinkle, A. M. Sonnet, E. M. Vogel, S. McDonnell, G. J. Hughes, M. Milojevic, B. Lee, F. S. Aguirre-Tostado, K. J. Choi, H. C. Kim, J. Kim, and R. M. Wallace, Appl. Phys. Lett. 0003-6951 92, 071901 (2008). 10.1063/1.2883956
- (2008) Appl. Phys. Lett. , vol.92 , pp. 071901
- Hinkle, C.L.¹ Sonnet, A.M.² Vogel, E.M.³ McDonnell, S.⁴ Hughes, G.J.⁵ Milojevic, M.⁶ Lee, B.⁷ Aguirre-Tostado, F.S.⁸ Choi, K.J.⁹ Kim, H.C.¹⁰ Kim, J.¹¹ Wallace, R.M.¹²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.