A simple approach to reduce interlayer formation of sputtered HF-based gate dielectrics by nitrogen incorporation

ECS Transactions

Volumn 1, Issue 5, 2006, Pages 425-430

  Lu, C H ^a   Lai, Yi Sheng ^a   Chen, J S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GLANCING INCIDENT ANGLE X-RAY DIFFRACTION (GIAXRD); HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HR-TEM); INTERFACIAL LAYERS (IL); SPECTROSCOPIC ELLIPSOMETRY;

DIELECTRIC FILMS;

EID: 33845268615     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2209292     Document Type: Conference Paper

References (20)

1. J. D. Plummer and P. B. Griffin, Proc. IEEE 89, 240 (2001).
2. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
3. B. H. Lee, L. Kang, R. Nieh, W. -J. Qi, and J. C. Lee, Appl. Phys. Lett. 76, 1926 (2000).
4. W. J. Qi, R. Nieh, B. H. Lee, L. Kang, Y. Jeon, and J. C. Lee, Appl. Phys. Lett. 77, 3269 (2000).
5. S. Guha, E. Cartier, M. A. Gribelyuk, N. A. Borjarczuk, and M. A. Coppel, Appl. Phys. Lett. 77, 2710 (2000).
6. L. Kang, B. H. Lee, W. -J. Qi, Y. Jeon, R. Nieh, S. Gopalan, K. Onishi, and J. C. Lee, IEEE Electron Device Lett. 21, 181 (2000).
7. A. Callegari, E. Cartier, M. Gribelyuk, H. F. Okom-Schmidt, and T. Zabel, J. Appl. Phys. 90, 6466 (2001).
8. W. J. Zhu, T. P. Ma, T. Tamagawa, J. Kim, and Y. Di, IEEE Electron Device Lett. 23, 97 (2002).
9. B. C. Hendrix, A. S. Borovik, C. Xu, J. F. Roeder, T. H. Baum, M. J. Bevan, M. R. Visokay, J. J. Chambers, A. L. Rotondaro, H. Bu, and L. Colombo, Appl. Phys. Lett. 80, 2362 (2002).
10. D. G. Schlom and J. H. Haeni, MRS Bulletin 27, 198 (2002).
11. K. Yamamoto, S. Hayashi, M. Kubota and M. Niwa, Appl. Phys. Lett. 81, 2053 (2002).
12. M. R. Visokay, J. J. Chambers, A. L. P. Rotondaro, A. Shanware, and L. Colombo, Appl. Phys. Lett. 80, 3183 (2002).
13. C. H. Choi, T. S. Jeon, R. Clark, and D. L. Kwong, IEEE Electron Dev. Lett. 24, 215 (2003).
14. C. S. Kang, H.-J. Cho, K. Onishi, R. Nieh, R. Choi, S. Gopalan, S. Krishnan, J. H. Han, and J. C. Lee, Appl. Phys. Lett. 81, 2593 (2002).
15. M. L. Green, E. P. Gusev, R. Degraeve, and E. L. Garfunkel, J. Appl. Phys. 90, 2057 (2001).
16. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, J. Chastain and R. C. King, Jr., Editor, Physical Electronics Inc., Minnesota (1995).
17. B. Jobs, C. Herzinger, and B. Guenther, WVASE32 Version 3.460, J. A. Woollam Co., Lincoln, NE USA
18. E. Pelletier, Handbook of Optical Constants of Solids II, E. D. Palik, Editor, Academic, New York (1991), p. 65.
19. J. Qi, D. Xue, H. Ratajczak, and G. Ning, Physica B 349, 265 (2004).
20. C. Z. Tan, J. Arndt, and H. S. Xie, Physica B 252, 28 (1998).