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Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6548-6551

Pulsed laser deposition and characterization of Hf-based high-k dielectric thin films

Author keywords

Hafnium dioxide; High k dielectric; Pulsed laser deposition; XAFS

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC FILMS; FIELD EFFECT TRANSISTORS; HAFNIUM COMPOUNDS; PULSED LASER DEPOSITION; SILICA;

EID: 34247501203     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.171     Document Type: Article
Times cited : (24)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.