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Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6548-6551
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Pulsed laser deposition and characterization of Hf-based high-k dielectric thin films
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Author keywords
Hafnium dioxide; High k dielectric; Pulsed laser deposition; XAFS
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
DIELECTRIC FILMS;
FIELD EFFECT TRANSISTORS;
HAFNIUM COMPOUNDS;
PULSED LASER DEPOSITION;
SILICA;
HAFNIUM DIOXIDE;
HIGH-K DIELECTRICS;
XAFS;
THIN FILMS;
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EID: 34247501203
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2006.11.171 Document Type: Article |
Times cited : (24)
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References (9)
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