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Volumn 281, Issue 2-4, 2005, Pages 452-457

Crystalline phases, microstructures and electrical properties of hafnium oxide films deposited by sol-gel method

Author keywords

A1. Crystal structure; A1. X ray diffraction; B1. Oxides; B2. Dielectric materials

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; CURRENT DENSITY; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; FILM GROWTH; GRAIN SIZE AND SHAPE; HAFNIUM COMPOUNDS; MICROSTRUCTURE; OXIDES; SOL-GELS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 22144476901     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.04.036     Document Type: Article
Times cited : (28)

References (20)
  • 13
    • 22144466444 scopus 로고    scopus 로고
    • JCPDS Card No. 6-0318, Joint Committee for Powder Diffraction Standards, Swarthmore, Pennsylvania, 1984
    • JCPDS Card No. 6-0318, Joint Committee for Powder Diffraction Standards, Swarthmore, Pennsylvania, 1984.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.