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Volumn 281, Issue 2-4, 2005, Pages 452-457
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Crystalline phases, microstructures and electrical properties of hafnium oxide films deposited by sol-gel method
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Author keywords
A1. Crystal structure; A1. X ray diffraction; B1. Oxides; B2. Dielectric materials
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Indexed keywords
CRYSTAL STRUCTURE;
CRYSTALLINE MATERIALS;
CURRENT DENSITY;
DEPOSITION;
DIELECTRIC MATERIALS;
ELECTRIC PROPERTIES;
FILM GROWTH;
GRAIN SIZE AND SHAPE;
HAFNIUM COMPOUNDS;
MICROSTRUCTURE;
OXIDES;
SOL-GELS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
CURRENT-VOLTAGE MEASUREMENTS;
HAFNIUM OXIDES;
LEAKAGE CURRENT DENSITY;
SPHERULITE GRAIN STRUCTURE;
THIN FILMS;
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EID: 22144476901
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.04.036 Document Type: Article |
Times cited : (28)
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References (20)
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