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Volumn 278, Issue 1-4, 2005, Pages 624-628
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Depth-profile study of the electronic structures at Ga2O 3(Gd2O3) and Gd2O3-GaN interfaces by X-ray photoelectron spectroscopy
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Author keywords
A1. Interfaces; A3. Molecular beam epitaxy; B1. Gadolinium compounds; B1. Nitrides; B2. Dielectric materials; B2. Semiconducting gallium compounds
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Indexed keywords
DIELECTRIC MATERIALS;
ELECTRONIC STRUCTURE;
GADOLINIUM COMPOUNDS;
MOLECULAR BEAM EPITAXY;
NITRIDES;
OXIDES;
PROFILOMETRY;
SPUTTERING;
SYNCHROTRON RADIATION;
X RAY PHOTOELECTRON SPECTROSCOPY;
DEPTH PROFILE;
GATE LEAKAGE;
HIGH BREAKDOWN FIELDS;
INTERFACES;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 18444388307
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.12.128 Document Type: Conference Paper |
Times cited : (23)
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References (8)
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