Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films

Journal of Applied Physics

Volumn 90, Issue 12, 2001, Pages 6466-6475

  Callegari, A ^a   Cartier, E ^a   Gribelyuk, M ^a   Okorn Schmidt, H F ^a   Zabel, T ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035894001     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1417991     Document Type: Article

References (19)

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