Advances in silicon carbide science and technology at the micro- and nanoscales

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 5, 2013, Pages

  Maboudian, Roya ^a   Carraro, Carlo ^a   Senesky, Debbie G ^b   Roper, Christopher S ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Department of Aeronautics and Astronautics Department of Mechanical Engineering and Industrial for Computational and Mathematical Engineering   (United States)

^c Hughes Aircraft Co   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSIVE ENVIRONMENT; GROWTH PROCESS OPTIMIZATION; LOW DIMENSIONAL STRUCTURE; MANUFACTURING TECHNOLOGIES; PROCESSING TECHNOLOGIES; SCIENCE AND TECHNOLOGY; SENSOR TECHNOLOGIES; SILICON CARBIDE THIN FILM;

DEPOSITION; HIGH TEMPERATURE APPLICATIONS; OPTIMIZATION; TECHNOLOGY;

SILICON CARBIDE;

EID: 84885111146     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4807902     Document Type: Review

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