Study of reaction process on Ni/4H-SiC contact

Materials Science and Technology

Volumn 22, Issue 10, 2006, Pages 1227-1234

  Cao, Y ^a   Nyborg, L ^a   Yi, D Q ^b   Jelvestam, U ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^b CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Interfacial reaction; Metal contact; Silicon carbide

Indexed keywords

RAMAN SPECTROSCOPY; REACTION KINETICS; SILICON CARBIDE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAPHITISATION; INTERFACIAL REACTIONS; METAL CONTACTS; REACTION RATE;

NICKEL;

EID: 33750574721     PISSN: 02670836     EISSN: None     Source Type: Journal    
DOI: 10.1179/174328406X118276     Document Type: Article

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