Photoelectrochemical etching to fabricate single-crystal SiC MEMS for harsh environments

Materials Letters

Volumn 65, Issue 3, 2011, Pages 409-412

  Zhao, Feng ^a   Islam, Mohammad M ^a   Huang, Chih Fang ^b  

^a The Department of Mechanical Engineering   (United States)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Biomedical sensing; High temperature; Microelectromechanical systems (MEMS); Photoelectrochemical etching; SiC; Single crystal

Indexed keywords

BIOCOMPATIBILITY; ELECTROCHEMISTRY; ELECTROMECHANICAL DEVICES; ETCHING; HIGH TEMPERATURE OPERATIONS; MEMS; MICROMACHINING; MICROMECHANICS; MONOLITHIC INTEGRATED CIRCUITS; SINGLE CRYSTALS; SURFACE MICROMACHINING;

BIOMEDICAL SENSING; FLAT BAND POTENTIAL; HIGH TEMPERATURE; MICRO ELECTROMECHANICAL SYSTEM (MEMS); MONOLITHIC INTEGRATION; PHOTO-ELECTROCHEMICAL ETCHING; SELECTIVE ETCHING; SENSING AND ACTUATING;

SILICON CARBIDE;

EID: 78549269475     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.10.034     Document Type: Article

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