Development of amorphous SiC for MEMS-based microbridges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6464, Issue , 2007, Pages

  Summers, James B ^a   Scardelletti, Maximilian ^b   Parro, Rocco ^a   Zorman, Christian A ^a  

^a CASE WESTERN RESERVE UNIVERSITY   (United States)

^b NASA GLENN RESEARCH CENTER   (United States)

Author keywords

PECVD; Residual stress microbridge actuators; Silicon carbide

Indexed keywords

AMORPHOUS SILICON; FILM THICKNESS; MEMS; PARAMETER ESTIMATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

AMORPHOUS HYDROGENATED SILICON CARBIDE; DEPOSITION PARAMETERS; MICROBRIDGES; RESIDUAL STRESS MICROBRIDGE ACTUATORS;

SILICON CARBIDE;

EID: 34248579463     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.704705     Document Type: Conference Paper

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