Recent progress toward a manufacturable polycrystalline SiC surface micromachining technology

IEEE Sensors Journal

Volumn 4, Issue 4, 2004, Pages 441-448

  Gao, Di ^a   Wijesundara, Muthu B J ^a   Carraro, Carlo ^a   Howe, Roger T ^a   Maboudian, Roya ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Chemical vapor deposition; Microelectromechanical systems (MEMS); Reactive ion etching; Silicon carbide (SiC); Surface micromachining

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENERGY GAP; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; THIN FILMS;

ELECTRONIC COMPONENTS; NONMETALLIC MASKING; SURFACE MICROMACHINING;

SILICON CARBIDE;

EID: 3142711483     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2004.828859     Document Type: Article

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