Chemomechanical polishing of silicon carbide

Journal of the Electrochemical Society

Volumn 144, Issue 6, 1997, Pages

  Zhou, Ling ^a   Audurier, Valerie ^a   Pirouz, Pirouz ^a   Powell, J Anthony ^b  

^a Case Western Reserve University   (United States)

^b NASA GLENN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ATOMIC FORCE MICROSCOPY; CHEMICAL POLISHING; CHROMIUM COMPOUNDS; COMPOSITION EFFECTS; FILM GROWTH; PH EFFECTS; SEMICONDUCTING FILMS; SILICA GEL; SURFACE ROUGHNESS; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

CHEMOMECHANICAL POLISHING; CHROMIUM OXIDE;

SILICON CARBIDE;

EID: 0031170485     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837711     Document Type: Article

References (12)

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