Etching of 3C-SiC using CHF3/O2 and CHF3/O2/He plasmas at 1.75 Torr

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 536-539

  Fleischman, Aaron J ^a   Zorman, Christian A ^a   Mehregany, Mehran ^a  

^a Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000600061     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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