Synthesis of silicon carbide thin films by ion beam sputtering

Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 80-84

  Valentini, A ^a   Convertino, A ^a   Alvisi, M ^b   Cingolani, R ^b   Ligonzo, T ^a   Lamendola, R ^a   Tapfer, L ^c  

^a UNIVERSITY OF BARI   (Italy)

^b INFM   (Italy)

^c Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali   (Italy)

Author keywords

Optical properties; Silicon carbide; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; FILM GROWTH; MICROSTRUCTURE; OPTICAL PROPERTIES; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; SPUTTERING; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION BEAM SPUTTERING;

THIN FILMS;

EID: 0032307127     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00895-5     Document Type: Article

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