Maskless sub-μm patterning of silicon carbide using a focused ion beam in combination with wet chemical etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 540-543

  Menzel, R ^a   Bachmann, T ^a   Wesch, W ^a   Hobert, H ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042340129     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589859     Document Type: Article

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