Focused ion beam (FIB) nanomachining of silicon carbide (SiC) stencil masks for nanoscale patterning

Materials Science Forum

Volumn 717-720, Issue , 2012, Pages 889-892

  Zamani, Hamidreza ^a   Lee, Seung Whan ^a   Avishai, Amir ^a   Zorman, Christian A ^a   Mohan Sankaran, R ^a   Feng, Philip X L ^a  

^a Case Western Reserve University   (United States)

Author keywords

3C SiC; Amorphous SiC; Focused ion beam (FIB); Membrane; Nanolithography; Nanoscale patterning; Nanoscale stencil mask; Poly SiC; Silicon carbide (SiC)

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; FOCUSED ION BEAMS; IONS; LITHOGRAPHY; MEMBRANES; NANOLITHOGRAPHY; NANOTECHNOLOGY;

3C-SIC; AMORPHOUS SIC; NANOSCALE PATTERNING; NANOSCALE STENCIL MASKS; POLY-SIC; SILICON CARBIDES (SIC);

SILICON CARBIDE;

EID: 84861409216     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.717-720.889     Document Type: Conference Paper

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