Chemical mechanical polishing of cubic silicon carbide films grown on Si(100) wafers

Journal of the Electrochemical Society

Volumn 149, Issue 12, 2002, Pages

  Fu, Xiao An ^a   Zorman, Christian A ^a   Mehregany, Mehran ^a  

^a CASE WESTERN RESERVE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ATOMIC FORCE MICROSCOPY; CHEMICAL MECHANICAL POLISHING; MORPHOLOGY; SILICON WAFERS; SURFACE CHEMISTRY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

REMOVAL RATES; SURFACE ROUGHNESS REDUCTION RATES;

SILICON CARBIDE;

EID: 0036959162     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1517285     Document Type: Article

References (19)

1. M. Mehregany, C. A. Zorman, S. Roy, A. J. Fleischman, C. H. Wu, and N. Rajan, Int. Mater. Rev., 45, 85 (2000).
2. Y. T. Yang, K. L. Ekinci, X. M. H. Huang, L. M. Schiavone, C. A. Zorman, M. Mehregany, and M. L. Roukes, Appl. Phys. Lett., 78, 162 (2001).
3. M. Kikuchi, Y. Takahashi, T. Suga, S. Suzuki, and Y. Bando, J. Am. Ceram. Soc., 75, 189 (1992).
4. W. Qian, M. Skowronski, G. Augustine, R. C. Glass, H. M. Hobgood, and R. H. Hopkins, J. Electrochem. Soc., 142, 4290 (1995).
5. E. K. Sanchez, S. Ha, J. Grin, M. Skowronski, W. M. Vetter, M. Dudley, R. Bertke, and W. C. Mitchel, J. Electrochem. Soc., 149, G131 (2002).
6. L. Zhou, V. Audurier, P. Pirouz, and J. A. Powell, J. Electrochem. Soc., 144, L161 (1997).
7. S. E. Saddow, T. E. Schattner, J. Brown, L. Grazulis, K. Mahalingam, G. Landis, R. Bertke, and W. C. Mitchel, J. Electron. Mater., 30, 228 (2000).
8. W. C. Mitchel, J. Brown, D. Buckanan, R. Bertke, K. Malalingham, F. D. Orazio Jr., P. Pirouz, H. J. R. Tseng, U. B. Ramabadran, and B. Roughani, Mater. Sci. Forum, 338-342, 841 (2000).
9. A. A. Yasseen, C. A. Zorman, and M. Mehregany, J. Electrochem. Soc., 146, 327 (1999).
10. R. DeAnna, A. J. Fleischman, C. A. Zorman, and M. Mehregany, J. Chem. Vapor Deposition, 6, 280 (1999).
11. Operation Manual for the Filmetrics F20, Filmetrics Inc., San Diego, CA 92111.
12. G. R. Yang, Y. P. Zhao, Y. Z. Hu, T. P. Chow, and R. J. Gutmann, Thin Solid Films, 333, 219 (1998).
13. F. Preston, J. Soc. Glass Technol., 11, 214 (1927).
14. R. Jairath, J. Farkas, C. K. Huang, M. Stell, and S. Tzeng, Solid State Technol., 37, 71 (1994).
15. Y. Z. Hu, R. J. Gutmann, and T. P. Chow, J. Electrochem. Soc., 145, 3919 (1998).
16. C. D. Wagner, W. M. Riggs, L. E. Davis, J. F. Moulder, and G. E. Muilenberg, Handbook of X-Ray Photoelectron Spectroscopy, Perkin Elmer, Eden Prairie, MN (1979).
17. B. Hornetz, H. J. Michel, and J. Halbritter, J. Vac. Sci. Technol. A, 13, 767 (1995).
18. M. Sreemany, T. B. Ghosh, B. C. Pai, and M. Chakraborty, Mater. Res. Bull., 33, 189 (1998).
19. Z. Zhu, V. Muratov, and T. E. Fischer, Wear, 225-229, 848 (1999).