Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 1, 2011, Pages 0108011-01080135

  Oehrlein, Gottlieb S ^a   Phaneuf, Raymond J ^b   Graves, David B ^c  

^a UNIVERSITY OF MARYLAND   (United States)

^b LABORATORY FOR PHYSICAL SCIENCES   (United States)

^c University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; HYDROCARBONS; ION BOMBARDMENT; IONS; MASKS; METAL ANALYSIS; MULTIPHOTON PROCESSES; NANOSTRUCTURED MATERIALS; ORGANIC POLYMERS; PHOTORESISTS; PLASMA ETCHING; PLASMA STABILITY; PLASMAS; POLYMERS; POLYSTYRENES; SURFACE PROPERTIES; VACUUM; VACUUM APPLICATIONS;

B-Y IONS; BI-LAYER; BLOCK COPOLYMER SELF-ASSEMBLY; ELASTIC BUCKLING; ENERGETIC ION; ENERGETIC PARTICLE FLUX; EXPERIMENTAL PARAMETERS; EXTREME ULTRAVIOLET LITHOGRAPHIC; FORMATION MECHANISM; GRAPHITIC LAYERS; HIGHLY SENSITIVE; HYDROCARBON POLYMERS; IMAGE TRANSFER; LINE EDGE ROUGHNESS; LITERATURE DATA; MASK FEATURES; MASK PATTERNS; MEASURED PROPERTIES; MODIFIED LAYER; MODIFIED SURFACES; MORPHOLOGICAL CHANGES; NANO-SCALE FABRICATION; NANO-SCALE MATERIALS; NANOMETER SCALE DEVICES; NANOMETER-SCALE RESOLUTION; NANOSCALE TECHNOLOGIES; ORGANIC FILMS; ORGANIC MATERIALS; PHOTOLITHOGRAPHIC PATTERNING; PHOTORESIST MATERIALS; PHOTORESIST PATTERNS; PLASMA ETCH; PLASMA ETCHING TECHNIQUE; PLASMA-INDUCED; POLYMER INTERACTIONS; POLYMER MATERIALS; POLYMER MODIFICATIONS; POLYMER RESIST; POLYMER STRUCTURE; POLYMER SURFACES; PROCESS PARAMETERS; RELATIVE IMPORTANCE; RESIST PATTERN; RESIST POLYMERS; SOFT LITHOGRAPHY; SYNERGISTIC EFFECT; ULTRAHIGH VACUUM SYSTEM; ULTRAVIOLET IRRADIATIONS; UNDERLAYERS; VACUUM ULTRAVIOLETS;

SURFACE ROUGHNESS;

EID: 79551627020     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3532949     Document Type: Review

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