Ar+ bombardment of 193 nm photoresist: Morphological effects

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages 1236-1243

  Pargon, E ^a,b   Nest, D ^a   Graves, D B ^a  

^a University of California   (United States)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; PHOTORESISTS; PLASMA ETCHING; POSITIVE IONS;

LONGITUDINAL RIPPLES; RESEMBLING STRIATIONS; SIDEWALL STRIATIONS;

ION BOMBARDMENT;

EID: 34547584220     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2747630     Document Type: Article

References (30)

1. J. Abe, H. Hayashi, Y. Taniguchi, H. Kato, Y. Onishi, I. Sakai, and T. Ohiwa, 27th International Symposium on Dry Process, 2005.
2. N. Negishi, H. Takesue, M. Sumiya, T. Yoshida, Y. Momonoi, and M. Izawa, J. Vac. Sci. Technol. B 23, 217 (2005).
3. J. Kim, Y. S. Chae, W. S. Lee, J. W. Shon, C. J. Kang, W. S. Han, and J. T. Moon, J. Vac. Sci. Technol. B 21, 790 (2003).
4. M. C. Kim, D. Shamiryan, Y. Jung, W. Boullart, C. J. Kang, and H. K. Cho, J. Vac. Sci. Technol. B 24, 2645 (2006).
5. A. P. Mahorowala, K. J. Chen, R. Sooriyakumaran, A. Clancy, D. Murthy, and S. Rasgon, Proc. SPIE 5753, 380 (2005).
6. L. Ling, X. Hua, X. Li, G. S. Oehrlein, E. A. Hudson, P. Lazzeri, and M. Anderle, J. Vac. Sci. Technol. B 22, 2594 (2004).
7. A. P. Mahorowala and D. R. Mederios, J. Vac. Sci. Technol. A 19, 1374 (2001).
8. H. Gokan, S. Esho, and Y. Ohnishi, J. Electrochem. Soc. 130, 143 (1983).
9. J. Zekonyte, V. Zaporojtchenko, and F. Faupel, Nucl. Instrum. Methods Phys. Res. B 236, 241 (2005).
10. Stopping and Range of Ions in Matter, www.srim.org.
11. R. D. Kolasinski, J. E. Polk, D. Goebel, and L. K. Johnson, American Institute of Aeronautics and Astronautics, July 2006.
12. R. M. Bradley and J. M. E. Harper, J. Vac. Sci. Technol. A 6, 2390 (1988).
13. P. Sigmund, Phys. Rev. 184, 383 (1969).
14. S. Rusponi, G. Costantini, C. Boragno, and U. Valbusa, Phys. Rev. Lett. 81, 2735 (1998).
15. E. Chason, J. Erlebacher, M. J. Aziz, J. A. Floro, and M. B. Sinclair, Nucl. Instrum. Methods Phys. Res. B 178, 55 (2001).
16. E. Chason, T. M. Mayer, B. K. Kellerman, D. T. McIlroy, and A. J. Howard, Phys. Rev. Lett. 72, 3040 (1994).
17. S. Hazra, T. K. Chini, M. K. Sanyal, J. Grenzer, and U. Pietsch, Phys. Rev. B 70, 121307 (2004).
18. A. D. Brown and J. Erlebacher, Phys. Rev. B 72, 075350 (2005).
19. T. M. Mayer, E. Chason, and A. J. Howard, J. Appl. Phys. 76, 1633 (1994).
20. S. W. MacLaren, J. E. Baker, N. L. Finnegan, and C. M. Loxton, J. Vac. Sci. Technol. A 10, 468 (1992).
21. S. M. Rossnagel, R. S. Robinson, and H. R. Kaufman, Surf. Sci. 123, 89 (1982).
22. R. Ditchfield and E. G. Seebauer, Phys. Rev. Lett. 82, 1185 (1999).
23. M. A. Makeev and A. L. Barabasi, Appl. Phys. Lett. 71, 2800 (1997).
24. S. Park, B. Kahng, H. Jeong, and A. L. Barabasi, Phys. Rev. Lett. 83, 3486 (1999).
25. G. Carter and V. Vishnyakov, Phys. Rev. B 54, 17647 (1996).
26. A. Datta, Y. R. Wu, and Y. L. Wang, Phys. Rev. B 63, 125407 (2001).
27. M. A. Makeev, R. Cuerno, and A. L. Barabasi, Nucl. Instrum. Methods Phys. Res. B 197, 185 (2002).
28. T. M. Mayer, D. P. Adams, M. J. Vasile, and K. M. Archuleta, J. Vac. Sci. Technol. A 23, 1579 (2005).
29. C. Andes (private communication).
30. S. Habenicht, W. Bolse, K. P. Lieb, K. Reimann, and U. Geyer, Phys. Rev. B 60, R2200 (1999).