Advancements in EUV resist materials and processing

Journal of Photopolymer Science and Technology

Volumn 22, Issue 1, 2009, Pages 59-64

  Itani, Toshiro ^a   Oizumi, Hiroaki ^a   Kaneyama, Koji ^a   Kawamura, Daisuke ^a   Kobayashi, Shinji ^a   Santillan, Julius Joseph ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV resist; LWR; Manufacturability; Resolution limit; Sensitivity

Indexed keywords

EID: 70249117504     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.59     Document Type: Article

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