Resists for next generation lithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 707-715

  Brainard, Robert L ^a   Barclay, George G ^a   Anderson, Erik H ^b   Ocola, Leonidas E ^c  

^a SHIPLEY COMPANY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c AGERE SYSTEMS   (United States)

Author keywords

EPL; EUV; IPL; LER; NGL; Photoresists; Resists; Resolution; X ray

Indexed keywords

OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; PHOTONS; SEMICONDUCTOR DEVICES; X RAY ANALYSIS;

OPTICAL TECHNOLOGY;

MICROELECTRONICS;

EID: 10444235423     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00564-6     Document Type: Conference Paper

References (13)

1. ITRS 2000 update: Lithography