Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Kawahira, Hiroichi ^a   Matsuzawa, Nobuyuki N ^a   Matsui, Eriko ^a   Ando, Atsuhiro ^a   Salam, Kazi M A ^a   Yoshida, Masashi ^a   Yamaguchi, Yuko ^a   Kugimiya, Katsuhisa ^a   Tatsumi, Tetsuya ^a   Nakano, Hiroyuki ^a   Iwai, Takeshi ^b   Irie, Makiko ^b  

^a SONY CORPORATION   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

butyrolactone; plot; ArF photoresist; Capacitively coupled plasma; Fourier analysis; FTIR; HBr plasma; HBr treatment; Inductively coupled plasma; Line width roughness

Indexed keywords

COPOLYMERIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MONOMERS; PATTERN MATCHING; PLASMA APPLICATIONS; SURFACE ROUGHNESS;

Γ-BUTYROLACTONE; ARF PHOTORESIST; CAPACITIVELY COUPLED PLASMA; FOURIER ANALYSIS; HBR PLASMA; HBR TREATMENT; LINE WIDTH ROUGHNESS (LWR); SIGMA;-PLOT; SOFTENING PROCESS; SOFTENING TEMPERATURE;

PHOTORESISTS;

EID: 33745629852     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656002     Document Type: Conference Paper

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