Gas utilization in remote plasma cleaning and stripping applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2102-2107

  Kastenmeier, B E E ^a   Oehrlein, G S ^b   Langan, John G ^c   Entley, William R ^c  

^a IBM RESEARCH   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; DISSOCIATION; ETCHING; MASS SPECTROMETRY; NITROGEN COMPOUNDS; PLASMA APPLICATIONS; SILICA; SILICON NITRIDE;

DISSOCIATION EFFICIENCY; PLASMA CLEANING;

STRIPPING (REMOVAL);

EID: 0034275380     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1287442     Document Type: Article

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