Extreme ultraviolet lithography

IEEE Journal of Quantum Electronics

Volumn 35, Issue 5, 1999, Pages 694-699

  Stulen, Richard H ^a,c   Sweeney, Donald W ^b,d  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c PURDUE UNIVERSITY   (United States)

^d UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING SYSTEMS; INTEGRATED CIRCUIT MANUFACTURE; LASER PRODUCED PLASMAS; MASKS; PLASMA SOURCES; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0032652144     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/3.760315     Document Type: Article

References (15)

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