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Volumn 44, Issue 8, 2005, Pages 6341-6348

Effects of photoresist polymer molecular weight and acid-diffusion on line-edge roughness

Author keywords

Acid diffusion; Lithography; Monte Carlo simulation; Photoresists; Polymer dissolution; Roughness; Stochastic simulation

Indexed keywords

DIFFUSION; LITHOGRAPHY; MOLECULAR WEIGHT; MONTE CARLO METHODS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

EID: 31544482669     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.6341     Document Type: Article
Times cited : (23)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.