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Volumn 44, Issue 8, 2005, Pages 6341-6348
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Effects of photoresist polymer molecular weight and acid-diffusion on line-edge roughness
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Author keywords
Acid diffusion; Lithography; Monte Carlo simulation; Photoresists; Polymer dissolution; Roughness; Stochastic simulation
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Indexed keywords
DIFFUSION;
LITHOGRAPHY;
MOLECULAR WEIGHT;
MONTE CARLO METHODS;
PHOTORESISTS;
SCANNING ELECTRON MICROSCOPY;
SURFACE ROUGHNESS;
ACID-DIFFUSION;
POLYMER DISSOLUTION;
STOCHASTIC SIMULATION;
POLYMERS;
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EID: 31544482669
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.44.6341 Document Type: Article |
Times cited : (23)
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References (25)
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