Etching and structural changes in nitrogen plasma immersion ion implanted polystyrene films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 247, Issue 2, 2006, Pages 254-260

  Gan, B K ^a   Bilek, M M M ^a   Kondyurin, A ^a   Mizuno, K ^a   McKenzie, D R ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Amorphous carbon; DLC; Ion implantation; Optical properties; Polymer modification; Polystyrene

Indexed keywords

CARBON; ELLIPSOMETRY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION IMPLANTATION; NITROGEN; OPTICAL PROPERTIES; OXIDATION; PLASMAS; SILICON WAFERS; STRUCTURAL ANALYSIS; SUBSTRATES; THIN FILMS;

AMORPHOUS CARBON; POLYMER MODIFICATION;

POLYSTYRENES;

EID: 33747502182     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.01.063     Document Type: Article

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