Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation

Applied Physics Letters

Volumn 92, Issue 15, 2008, Pages

  Nest, D ^a   Graves, D B ^a   Engelmann, S ^b   Bruce, R L ^b   Weilnboeck, F ^b   Oehrlein, G S ^b   Andes, C ^c   Hudson, E A ^d  

^a University of California   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c ROHM AND HAAS COMPANY   (United States)

^d LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BOND STRENGTH (CHEMICAL); ION BOMBARDMENT; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

CARBON-OXYGEN BONDS; SYNERGISTIC EFFECTS; VACUUM ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 42349103371     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2912028     Document Type: Article

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