Top surface imaging process and materials development for 193 nm and extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3722-3725

  Rao, Veena ^a   Hutchinson, John ^a   Holl, Susan ^a   Langston, Joseph ^a   Henderson, Craig ^b   Wheeler, David R ^b   Cardinale, Greg ^b   O'Connell, Donna ^b   Goldsmith, John ^b   Bohland, John ^c   Taylor, Gary ^c   Sinta, Roger ^c  

^a INTEL CORPORATION   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744356176     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590397     Document Type: Article

References (15)

1. J. W. Thackeray, J. F. Bohland, E. K. Pavelchek, G. W. Orsula, A. W. McCullough, S. K. Jones, and S. M. Bobbio, Proc. SPIE 1185, 2 (1989).
2. G. N. Taylor, L. E. Stillwagon, and T. Venkatesan, J. Electrochem. Soc. 131, 1658 (1984).
3. F. Coopmans and B. Roland, Proc. SPIE 633, 126 (1986).
4. A. Weill, P. Paniez, O. Joubert, F. Debaene, D. Sage, and G. Amblart, Proc. SPIE 1925, 258 (1993).
5. S. C. Palmateer, R. R. Kunz, M. W. Horn, A. R. Forte, and M. Rothschild, Proc. SPIE 2438, 455 (1995).
6. D. Wheeler, R. Hutton, C. Boyce, S. Stein. R. Cirelli, and G. Taylor, Proc. SPIE 2438, 762 (1995).
7. J. Hutchinson, V. Rao, G. Zhang, A. Pawloski, C. Fonseca, J. Chambers, S. Holl, S. Das, C. Henderson, and D. Wheeler, Proc. SPIE 3333, 165 (1998).
8. J. F. Bohland, J. Chambers, S. Das, T. H. Fedynyshyn, S. M. Holl, J. Hutchiinson, V. Rao, and R. F. Sinta, Proc. SPIE 3333, 1009 (1998).
9. S. Palmateer, "Critical Dimension Control for 0.13 mm Lithography: Phase II" preliminary report, October 15, 1997.
10. C. Lee, S. Das, J. Yang, T. Weidman, D. Sugiarto, M. Nault, D. Mui, and Z. Osborne, Proc. SPIE 3333, 625 (1998).
11. T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki, Appl. Phys. Lett. 63, 764 (1993).
12. T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki, Jpn. J. Appl. Phys., Part 1 32, 6065 (1993).
13. H. Namamatsu, Y. Takahashi, K. Yamakazi, T. Yamaguchi, M. Nagase, and K. Kurihara, J. Vac. Sci. Technol. B 16, 69 (1998).
14. S. Palmateer, "Critical Dimension Control for 0.13 mm Lithography: Phase I" final report, April 28, 1997.
15. J. Hutchinson. Proc. SPIE (in press).