SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 79, Issue 3, 2001, Pages 409-411

Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication

(6) Black, C T a Guarini, K W a Milkove, K R a Baker, S M b Russell, T P b Tuominen, M T b

a IBM T J WATSON RESEARCH CENTER (United States)

b UNIVERSITY OF MASSACHUSETTS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; DRY ETCHING; INTEGRATED CIRCUIT MANUFACTURE; MASKS; MOS CAPACITORS; PHASE SEPARATION; POLYMETHYL METHACRYLATES; POLYSTYRENES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

PHOTOLITHOGRAPHIC RESOLUTION LIMITS;

BLOCK COPOLYMERS;

EID: 0035898436 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1383805 Document Type: Article

Times cited : (353)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.