Block copolymer micelle nanolithography

Nanotechnology

Volumn 14, Issue 10, 2003, Pages 1153-1160

  Glass, Roman ^a   Möller, Martin ^b   Spatz, Joachim P ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; MICELLES; PHOTOLITHOGRAPHY; POLYSTYRENES; SELF ASSEMBLY; ULTRAVIOLET SPECTROSCOPY; VINYL RESINS; X RAY SPECTROSCOPY;

BLOCK COPOLYMER MICELLE NANOLITHOGRAPHY; LIQUID FILM; MONOMICELLAR FILMS; POLYSTYRENE POLYVINYLPYRIDINE;

NANOTECHNOLOGY;

EID: 0142217347     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/14/10/314     Document Type: Article

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