Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening

Journal of Physics D: Applied Physics

Volumn 43, Issue 27, 2010, Pages

  Chung, T Y ^a   Nest, D ^a   Graves, D B ^a   Weilnboeck, F ^b   Bruce, R L ^b   Oehrlein, G S ^b   Wang, D ^c   Li, M ^c   Hudson, E A ^d  

^a University of California   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

^c DOW CHEMICAL COMPANY   (United States)

^d LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

193 NM PHOTORESISTS; CARBON RICH; ENHANCED SURFACE; FLUENCES; LOW TEMPERATURE PLASMAS; PHOTON IRRADIATION; SURFACE LAYERS; SURFACE-ROUGHENING; SYNERGISTIC INTERACTION; VACUUM ULTRAVIOLETS;

ELECTRON BEAMS; ION BOMBARDMENT; IONS; PHOTONS; PHOTORESISTS; SURFACE PROPERTIES; SURFACE ROUGHNESS; VACUUM;

ELECTRONS;

EID: 77953877071     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/27/272001     Document Type: Article

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