|
|
Volumn 61-62, Issue , 2002, Pages 763-770
|
|
Electron-beam nanolithography and line-edge roughness of acid-breakable resin-based positive resist
a
a
HITACHI LTD
(Japan)
|
|
Author keywords
Acid breakable resin; Electron beam lithography; Line edge roughness; Positive resist
|
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRON BEAM LITHOGRAPHY;
MOLECULAR WEIGHT DISTRIBUTION;
NANOTECHNOLOGY;
PHENOLS;
RESINS;
ELECTRON BEAM NANOLITHOGRAPHY;
RESIN-BASED POSITIVE RESISTS;
PHOTORESISTS;
|
|
EID: 0036643644
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(02)00453-7 Document Type: Conference Paper |
|
Times cited : (7)
|
|
References (12)
|
