Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1142-1155

  Bruce, R L ^a   Engelmann, S ^a   Lin, T ^a   Kwon, T ^a   Phaneuf, R J ^a   Oehrlein, G S ^a   Long, B K ^b   Willson, C G ^b   Vgh J J ^c   Nest, D ^c   Graves, D B ^c   Alizadeh, A ^d  

^a UNIVERSITY OF MARYLAND   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^c University of California   (United States)

^d GE GLOBAL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CEILINGS; ELECTRIC DISCHARGES; ELLIPSOMETRY; ESTERIFICATION; ESTERS; HIGH ENERGY PHYSICS; HYDROGEN; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; IONS; MAGNESIUM; MAGNESIUM COMPOUNDS; OXYGEN; PLASMA DEPOSITION; REACTION KINETICS; REFRACTIVE INDEX; STRIPPING (REMOVAL); STYRENE; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACE TREATMENT; VACUUM;

AR PLASMAS; ARGON PLASMAS; CEILING TEMPERATURES; DAMAGED LAYERS; ETCH BEHAVIOR; ETCH PROCESS; HIGH ENERGY ION BOMBARDMENT; HIGH-ENERGY IONS; HIGHER INDEX; IN-SITU ELLIPSOMETRY; INDUCTIVELY COUPLED PLASMA REACTOR; ION PENETRATION DEPTH; LOW ENERGY IONS; MAGNESIUM FLUORIDE; MATERIAL LOSS; MATERIAL REMOVAL; METHYLSTYRENE; OPTICAL MODELS; OXYGEN CONTENT; OXYGEN DEPLETION; PHYSICAL SPUTTERING; POLYMER INTERACTIONS; POLYMER STRUCTURE; POLYMER SURFACES; SIGNIFICANT IMPACTS; SUBSTRATE BIAS; SUBSTRATE TEMPERATURE; SURFACE MODIFICATION; SURFACE-ROUGHENING; TEMPERATURE DEPENDENT; VACUUM ULTRAVIOLETS; VUV RADIATION;

POLYMERS;

EID: 77149148803     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3136864     Document Type: Conference Paper

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