Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films

Applied Physics Letters

Volumn 71, Issue 16, 1997, Pages 2388-2390

  Yamaguchi, Toru ^a   Namatsu, Hideo ^a   Nagase, Masao ^a   Yamazaki, Kenji ^a   Kurihara, Kenji ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001013074     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120037     Document Type: Article

References (8)

1. K. Kurihara, K. Iwadate, H. Namatsu, H. Takenaka, and K. Murase, Jpn. J. Appl. Phys., Part 1 34, 6940 (1995).
2. Y. Takahashi, H. Namatsu, K. Kurihara, K. Iwadate, M. Nagase, and K. Murase, IEEE Trans. Electron Devices ED-43, 1213 (1996).
3. T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki, Appl. Phys. Lett. 63, 764 (1993).
4. E. W. Scheckler, S. Shukuri, and E. Takeda, Jpn. J. Appl. Phys., Part 1 32, 327 (1993).
5. M. Nagase, H. Namatsu, K. Kurihara, K. Iwadate, K. Murase, and T. Makino, Microelectron. Eng. 30, 419 (1996).
6. H. Namatsu, M. Nagase, K. Kurihara, K. Iwadate, T. Furuta, and K. Murase, J. Vac. Sci. Technol. B 13, 1473 (1995).
7. J. Spěváček and B. Schneider, Makromol. Chem. 176, 3409 (1975).
8. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).