A review of line edge roughness and surface nanotexture resulting from patterning processes

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1067-1072

  Gogolides, Evangelos ^a   Constantoudis, Vassilios ^a   Patsis, George P ^a   Tserepi, Angeliki ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Etching; Line edge roughness; Lithography; Nanotexturing; Plasma modification; Review; Surface roughness

Indexed keywords

LITHOGRAPHY; NANOTECHNOLOGY; PLASMA ETCHING; POLYSILICON; SILICON; TEXTURES;

INTERACTION TRIANGLE; LINE EDGE ROUGHNESS; NANOTEXTURING; PLASMA MODIFICATION;

SURFACE ROUGHNESS;

EID: 33748273736     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.162     Document Type: Article

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