Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

Journal of Applied Physics

Volumn 107, Issue 8, 2010, Pages

  Bruce, R L ^a   Weilnboeck, F ^a   Lin, T ^a   Phaneuf, R J ^a   Oehrlein, G S ^a   Long, B K ^b   Willson, C G ^b   Vegh, J J ^c   Nest, D ^c   Graves, D B ^c  

^a UNIVERSITY OF MARYLAND   (United States)

^b The University of Texas at Austin   (United States)

^c University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; BUCKLING MECHANISM; DAMAGED LAYERS; DOMINANT WAVELENGTH; ELASTIC BUCKLING; GLASS TRANSITION TEMPERATURE; IN-SITU ELLIPSOMETRY; INDUCTIVELY COUPLED PLASMA REACTOR; ION ENERGIES; MEASURED PROPERTIES; MODIFIED LAYER; MODIFIED SURFACES; MOLECULAR DYNAMICS SIMULATIONS; NANO SCALE; NANO-SCALE ROUGHNESS; PLASMA DAMAGE; PLASMA EXPOSURE; POLYMER SURFACES; POLYSTYRENE FILMS; SEMICONDUCTOR PROCESSING; SUBSTRATE BIAS; SURFACE LAYERS;

ARGON; ATOMIC FORCE MICROSCOPY; BUCKLING; ELECTROMAGNETIC INDUCTION; GLASS TRANSITION; INDUCTIVELY COUPLED PLASMA; MECHANICAL PROPERTIES; METAL ANALYSIS; MOLECULAR DYNAMICS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; PLASTIC FILMS; POLYMERS; POLYSTYRENES; SURFACE PROPERTIES; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRIC DISCHARGES;

EID: 77952418572     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3373587     Document Type: Article

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