Recent status and future direction of EUV resist technology

Microelectronic Engineering

Volumn 86, Issue 3, 2009, Pages 207-212

  Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV lithography; LWR; Recent status; Resolution; Sensitivity

Indexed keywords

EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT WATER REACTORS; LITHOGRAPHY; ROUGHNESS MEASUREMENT;

EUV LITHOGRAPHY; LWR; RECENT STATUS; RESOLUTION; SENSITIVITY;

ULTRAVIOLET DEVICES;

EID: 59049107668     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.023     Document Type: Article

References (26)

1. Wurm S., Jeon C., and Lercel M. Proc. SPIE 6517 (2007) 651705
2. Goethals A.M., Jonckheere R., Lorusso G.F., Hermans J., and Roey F.V. Proc. SPIE 6517 (2007) 651709
3. Harned N., Goethals M., Groeneveld R., Kuerz P., Lowisch M., Meijer H., Meiling H., Ronse K., Ryan J., Tittnish M., Voorma H., Zimmerman L., Mickan U., and Lok S. Proc. SPIE 6517 (2007) 651706
4. Mori I., Suga O., Tanaka H., Nishiyama I., Terasawa T., Shigemura H., Taguchi T., Tanaka T., and Itani T. Proc. SPIE 6921 (2008) 692102
5. LaFontaine B., Deng Y., Kim R., Levinson H., McGowan S., Okoroanyanwu U., Tabery C., Wallow T., Wood O., Bouten S., Crouse M., Cummings K., Galloway J., Han S., Kessels B., Lee B., Niekrewicz B., Pierson B., Routh R., Kimmel K., Koay C., Petrillo K., Word J., Sugawara M., and Mizuno H. Proc. SPIE 6921 (2008) 69210P
6. Kawamura D., Kaneyama K., Kobayashi S., Santillan J., and Itani T. Proc. SPIE 6923 (2008) 692313
7. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, ET-06, International EUVL Symposium 2007.
8. S. Kobayashi, J.J. Santillan, T. Itani, OL-P 05, Microelectron. Eng., in press.
9. Hirayama T., Shiono D., Hada H., Onodera J., and Ueda M. J. Photopolym. Sci. Technol. 17 (2004) 434
10. Yamaguchi A., Fukuda H., Arai T., Yamamoto J., Hirayama T., Shiono D., Hata H., Onodera J., and Vac J. Sci. Technol. B23 6 (2005) 2711-2715
11. T.H. Fedynyshyn, D.K. Astolfi, A. Cabral, J. Roberts, Proc. SPIE 6519 (2007) 65190X1-65190X6.
12. Wang M., Lee C.T., Henderson C., Yueh W., Roberts J.M., and Gonsalves K. Proc. SPIE 6923 (2008) 692312
13. Watanabe T., Kinoshita H., and Photopolym J. Sci. Technol. 20 (2007) 373-382
14. Oizumi H., Kumise T., and Itani T. J. Vac. Sci. Technol. B26 6 (2008) 2252-2256
15. Oizumi H., Kumise T., and Itani T. J. Photopolym. Sci. Technol. 21 (2008) 443
16. He D., and Cerrina F. J. Vac. Sci. Technol. B16 6 (1998) 3748-3751
17. Yoshimura T., Shiraishi H., Yamamoto J., and Okazaki S. Jpn. J. Appl. Phys. 32 (1993) 6065
18. Irie M., Suzuki T., Mimura T., and Iwai T. Proc. SPIE 6923 (2008) 692310
19. VanderHart D., De Silva A., Felix N., Prabhu V., and Oberd C. Proc. SPIE 6923 (2008) 69231M
20. Fedynyshyn T., Goodman R., and Roberts J. Proc. SPIE 6923 (2008) 692319
21. Lawson R., Lee C., Yueh W., Tolbert L., and Henderson C. Proc. SPIE 6923 (2008) 69230K
22. Hassanein E., Higgins C., Naulleau P., Matyi R., Gallatin G., Denbeaux G., Antohe A., Thackeray J., Spear K., Szmanda C., Anderson C., Niakoula D., Malloy M., Khurshid A., Montgomery C., Piscani E., Rudack A., Byers J., Ma A., Dean K., and Brainard R. Proc. SPIE 6921 (2008) 69211I
23. Brainard R., Hassanein E., Li J., Pathak P., Thiel B., Cerrina F., Moore R., Rodriguez M., Yakshinskiy B., Loginova E., Madey T., Matyi R., Malloy M., Rudack A., Naulleau P., Wüestc A., and Dean K. Proc. SPIE 6923 (2008) 692325
24. Kozawa T., and Tagawa S. Proc. SPIE 5753 (2005) 361-367
25. Kozawa T., and Tagawa S. J. Photopolym. Sci. Technol. 18 4 (2005) 471-474
26. Shirai M., Kurosima A., Okamura H., Kaneyama K., and Itani T. Proc. SPIE 6923 (2008) 692344