Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

Nature

Volumn 424, Issue 6947, 2003, Pages 411-414

  Kim, Sang Ouk ^a,c   Solak, Harun H ^b   Stoykovich, Mark P ^a   Ferrier, Nicola J ^a   De Pablo, Juan J ^a   Nealey, Paul F ^a  

^a University of Wisconsin ^*  (United States)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

^c Samsung SDS   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; GRAIN BOUNDARIES; LITHOGRAPHY; SELF ASSEMBLY; SUBSTRATES; THIN FILMS;

NANOPATTERNED SUBSTRATES;

BLOCK COPOLYMERS;

ACRYLIC ACID COPOLYMER; POLY(METHYL METHACRYLATE);

POLYMER;

ARTICLE; ELECTRIC FIELD; MOLECULAR INTERACTION; NANOTECHNOLOGY; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0042532330     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/nature01775     Document Type: Article

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