Mechanisms for plasma and reactive ion etch-front roughening

Physical Review B - Condensed Matter and Materials Physics

Volumn 61, Issue 4, 2000, Pages 3012-3021

  Drotar, Jason T ^a   Zhao, Y ^a   Lu, T ^a   Wang, G ^a  

^a Research Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001722905     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.61.3012     Document Type: Article

References (28)

1. Dynamics of Fractal Surfaces, edited by F. Family and T. Vicsek (World Scientific, Singapore, 1991).
2. Robert J. Hoekstra, Mark J. Kushner, Valeriy Sukharev, and Phillipe Schoenborn, J. Vac. Sci. Technol. B 16, 2102 (1998).
3. Vivek K. Singh, Eric S. G. Shaqfeh, and James P. McVittie, J. Vac. Sci. Technol. B 12, 2952 (1994).
4. Vivek K. Singh, Eric S. G. Shaqfeh, and James P. McVittie, J. Vac. Sci. Technol. B 10, 1091 (1992).
5. Pascal Brault, Philippe Dumas, and Franck Salvan, J. Phys.: Condens. Matter 10, L27 (1998).
6. Richard Pétri, Pascal Brault, Olivier Vatel, Daniel Henry, Elie André, Philippe Dumas, and Franck Salvan, J. Appl. Phys. 75, 7498 (1994).
7. R. P. U. Karunasiri, R. Bruinsma, and K. Rudnick, Phys. Rev. Lett. 62, 788 (1989).
8. Jian Hua Yao and Hong Guo, Phys. Rev. E 47, 1007 (1993).
9. Christopher Roland and Hong Guo, Phys. Rev. Lett. 66, 2104 (1991).
10. Phys. Rev. Lett.G. S. Bales and A. Zangwill, 63, 692 (1989).
11. Y.-P. Zhao, Jason T. Drotar, G.-C. Wang, and T.-M. Lu, Phys. Rev. Lett. 82, 4882 (1999).
12. G. S. Oehrlein, P. J. Matsuo, M. F. Doemling, N. K. Rueger, B. E. E. Kastenmeier, M. Schaepkens, T. Standaert, and J. J. Beulens, Plasma Sources Sci. Technol. 5, 1193 (1996).
13. Plasma Sources Sci. Technol.J. H. Keller, 5, 166 (1996).
14. G. S. Hwang, C. M. Anderson, M. J. Gordon, T. A. Moore, T. K. Minton, and K. P. Giapis, Phys. Rev. Lett. 77, 3049 (1996).
15. G. N. Patterson, Molecular Flow of Gases (Wiley, New York, 1956).
16. G. N. Patterson, Introduction to the Kinetic Theory of Gas Flow (University of Toronto Press, Toronto, 1971).
17. F. O. Goodman and H. Y. Wachman, Dynamics of Gas-Surface Scattering (Academic Press, New York, 1976).
18. F. Family and T. Vicsek, J. Phys. A 18, L75 (1985).
19. F. Family, Physica A 168, 561 (1990).
20. M. Kardar, G. Parisi, and Y.-C. Zhang, Phys. Rev. Lett. 56, 889 (1986).
21. J. G. Amar and F. Family, Phys. Rev. A 41, 3399 (1990).
22. K. Moser, D. E. Wolf, and J. Kertész, Physica A 178, 215 (1991).
23. F. Family, J. Phys. A 19, L441 (1986).
24. Jacques G. Amar, Pui-Man Lam, and Fereydoon Family, Phys. Rev. E 47, 3242 (1993).
25. Z.-W. Lai and S. Das Sarma, Phys. Rev. Lett. 66, 2348 (1991).
26. S. F. Edwards and D. R. Wilkinson, Proc. R. Soc. London, Ser. A 381, 17 (1982).
27. W. W. Mullins, J. Appl. Phys. 28, 333 (1957).
28. Jason T. Drotar, Y.-P. Zhao, T.-M. Lu, and G.-C. Wang, Phys. Rev. E 59, 177 (1999).